Abstract
As noted in Chapter 4, mathematical models are useful for understanding the mechanism of the chemical reaction and deposition process; the relative importance of various process parameters such as the laser irradiance, speed of the substrate with respect to the laser beam, laser pulselength, and wavelength; to analyze the LCVD experimental data; and to design and control the LCVD system in an optimum way. The mathematical modeling of photolytic LCVD differs from pyrolytic LCVD modeling in that the former involves photochemical reactions, whereas, the latter relies on the thermal decomposition of the reactant molecules. However, the transport mechanisms for the distribution of various species inside the deposition chamber are similar in the pyrolytic and photolytic processes and, for this reason, the transport equations are identical for the two processes. The source term, which represents the rate of production of the film material, is different for these two processes because it involves the Arrhenius rate expression and the laser intensity (or photon flux) for the pyrolytic and photolytic LCVD processes, respectively.
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Mazumder, J., Kar, A. (1995). Photolytic LCVD Modeling. In: Theory and Application of Laser Chemical Vapor Deposition. Lasers, Photonics, and Electro-Optics. Springer, Boston, MA. https://doi.org/10.1007/978-1-4899-1430-9_5
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DOI: https://doi.org/10.1007/978-1-4899-1430-9_5
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