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High Rate Reactive Sputtering onto Flexible Polymer Sheet

  • R. P. Howson
  • A. G. Spencer
  • K. Oka
  • R. W. Lewin

Abstract

The paper considers the use of a d.c. planar magnetron, used with optical emission control of the reactive gases and a controlled magnetic field, to allow plasma to be directed onto the growing film. It is demonstrated that these techniques lead to stable processes allowing the high rate production of compound films, with precisely controlled stoichiometry and structure, onto flexible polymer substrates.

Keywords

Oxygen Partial Pressure Indium Oxide Titanium Oxide Film Reactive Sputtering Metal Flux 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer Science+Business Media New York 1989

Authors and Affiliations

  • R. P. Howson
    • 1
  • A. G. Spencer
    • 1
  • K. Oka
    • 1
  • R. W. Lewin
    • 1
  1. 1.Department of PhysicsUniversity of TechnologyLoughborough, LeicestershireEngland, UK

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