High Rate Reactive Sputtering onto Flexible Polymer Sheet
The paper considers the use of a d.c. planar magnetron, used with optical emission control of the reactive gases and a controlled magnetic field, to allow plasma to be directed onto the growing film. It is demonstrated that these techniques lead to stable processes allowing the high rate production of compound films, with precisely controlled stoichiometry and structure, onto flexible polymer substrates.
KeywordsOxygen Partial Pressure Indium Oxide Titanium Oxide Film Reactive Sputtering Metal Flux
Unable to display preview. Download preview PDF.
- 1.R.P. Howson, in “Polymer Surfaces and Interfaces”, W. J. Feast and H.S. Munro, editors, Wiley, 1987.Google Scholar
- 2.J.L. Vossen and W. Kern, editors, “Thin Film Processes” Academic Press, New York, 1978.Google Scholar
- 3.S. Schiller, U. Heisig and K. Goedicke, in “Proc. Int. Conf. Solid Surfaces”, pp. 1545-52, 1977.Google Scholar
- 7.S. Schiller, U. Heisig, K. Steinfelder, J. Strumpfel, A. Friedrich and R. Fricke, in “Proc. Int. Conf. on Ion Plating and Allied Techniques,” Brighton, 1987, pp. 23–31, CEP Consultants, Edinburgh, 1987.Google Scholar
- 9.B. Window and N. Savvides, J. Vac. Sci. Tech., A4, 196, 1986.Google Scholar
- 12.A.G. Spencer and R.P. Howson, Proc. SPIE, 1016.Google Scholar