High Rate Reactive Sputtering onto Flexible Polymer Sheet

  • R. P. Howson
  • A. G. Spencer
  • K. Oka
  • R. W. Lewin


The paper considers the use of a d.c. planar magnetron, used with optical emission control of the reactive gases and a controlled magnetic field, to allow plasma to be directed onto the growing film. It is demonstrated that these techniques lead to stable processes allowing the high rate production of compound films, with precisely controlled stoichiometry and structure, onto flexible polymer substrates.


Oxygen Partial Pressure Indium Oxide Titanium Oxide Film Reactive Sputtering Metal Flux 
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Copyright information

© Springer Science+Business Media New York 1989

Authors and Affiliations

  • R. P. Howson
    • 1
  • A. G. Spencer
    • 1
  • K. Oka
    • 1
  • R. W. Lewin
    • 1
  1. 1.Department of PhysicsUniversity of TechnologyLoughborough, LeicestershireEngland, UK

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