Abstract
Polyimides are of great interest as insulators for microelectronic fabrication due to their low dielectric constant and planarizing properties. LCVD has been used to deposit material on a wide variety of substrates and for many microelectronic applications. We focus on the laser CVD of nickel on polyimide and the effects of this deposition on the electrical and mechanical surface properties of polyimides. We report on the effects of writing speed, laser power and reactant pressure on the deposition characteristics as well as the effects of the deposition on the underlying polyimide. A review of the microelectronic applications of metal depositions on polyimides will also be presented.
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Bezuk, S.J., Kryzak, C. (1989). Laser Stimulated Chemical Vapor Deposition of Metals on Polyimides. In: Mittal, K.L., Susko, J.R. (eds) Metallized Plastics 1. Springer, Boston, MA. https://doi.org/10.1007/978-1-4899-0879-7_1
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DOI: https://doi.org/10.1007/978-1-4899-0879-7_1
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