Stoichiometry and Deposition Rate of DC Magnetron Sputtered Y-Ba-Cu-O Thin Films as a Function of Target Presputtering Time
Y-Ba-Cu-O thin films have been grown from stoichiometric compound targets using dc magnetron sputtering. Initially the film composition was strongly off-stoichiometric and the deposition rate very low. However, after extensive presputtering stoichiometric films, with respect to the metal content, were deposited at a rate of 2–2.5 Å/s. The long pre-sputtering time (20–30 h) needed is due to a slowly changing oxygen content on the target surface. This is caused not only by preferential sputtering effects but also by bulk diffusion in the target.
KeywordsDeposition Rate Target Surface Film Composition Barium Fluoride Oxide Target
Unable to display preview. Download preview PDF.
- 9.S.M.Rossnagel, and J.J.Cuomo, presented at the AVS fall meeting, Anaheim, CA, USA, Nov. 6, 1987.Google Scholar
- 10.Preliminary Auger Electron Spectroscopy measurements on amorphous YBa2Cu30X films show that the time required to reach steady state during sputtering with Ar ions is in the order of seconds or minutes depending on the ion current and ion energy.Google Scholar