Stoichiometry and Deposition Rate of DC Magnetron Sputtered Y-Ba-Cu-O Thin Films as a Function of Target Presputtering Time

  • T. I. Selinder
  • G. Larsson
  • U. Helmersson
  • P. Olsson
  • J.-E. Sundgren
  • S. Rudner
  • L. D. Wernlund

Abstract

Y-Ba-Cu-O thin films have been grown from stoichiometric compound targets using dc magnetron sputtering. Initially the film composition was strongly off-stoichiometric and the deposition rate very low. However, after extensive presputtering stoichiometric films, with respect to the metal content, were deposited at a rate of 2–2.5 Å/s. The long pre-sputtering time (20–30 h) needed is due to a slowly changing oxygen content on the target surface. This is caused not only by preferential sputtering effects but also by bulk diffusion in the target.

Keywords

Deposition Rate Target Surface Film Composition Barium Fluoride Oxide Target 
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References

  1. 1.
    See for example, P.Chaudhari, R.H.Koch, R.B.Laibowitz, T.R.McGuire and R.H.Gambino, Phys.Rev.Lett. 58, 2684 (1987).CrossRefGoogle Scholar
  2. 2.
    D.Dijkkamp, T.Venkatesan, X.D.Wu, S.A.Shaheen, N.Jisrawi, Y.H.Min-Lee, W.L.McLean, and M.Croft, Appl.Phys.Lett. 51, 619 (1987).CrossRefGoogle Scholar
  3. 3.
    C.Webb, S.-L.Weng, J.N.Eckstein, N.Missert, K.Char, D.G.Schlom, E.S.Hellman, M.R.Beasley, A.Kapitulnik, and J.S.Harris,Jr, Appl.Phys.Lett. 51, 1191 (1987).CrossRefGoogle Scholar
  4. 4.
    See for example, T.Aida, T.Fukazawa, K.Takagi, and K.Miyauchi, Jpn.J.Appl.Phys. 26, L1489 (1987).CrossRefGoogle Scholar
  5. 5.
    Y.Enomoto, T.Murakami, M.Suzuki, and K.Moriwaki, Jpn.J.Appl.Phys. 26, L1248 (1987).CrossRefGoogle Scholar
  6. 6.
    R.E.Somekh, J.Vac.Sci.Technol.A 2, 1285 (1984).CrossRefGoogle Scholar
  7. 7.
    P.S.Ho, J.E.Lewis, H.S.Wildman and J.K.Howard, Surface Sci. 57, 393 (1976).CrossRefGoogle Scholar
  8. 8.
    D.Grischkowsky, M.L.Yu, and A.C.Balant, Surface Science 127, 315 (1983)CrossRefGoogle Scholar
  9. 9.
    S.M.Rossnagel, and J.J.Cuomo, presented at the AVS fall meeting, Anaheim, CA, USA, Nov. 6, 1987.Google Scholar
  10. 10.
    Preliminary Auger Electron Spectroscopy measurements on amorphous YBa2Cu30X films show that the time required to reach steady state during sputtering with Ar ions is in the order of seconds or minutes depending on the ion current and ion energy.Google Scholar
  11. 11.
    K.N.Tu, S.I.Park and C.C.Tsuei, Appl.Phys.Lett. 51, 2158 (1987).CrossRefGoogle Scholar
  12. 12.
    S.I.Shah and P.F.Carcia, Appl.Phys.Lett. 51, 2146 (1987).CrossRefGoogle Scholar

Copyright information

© Springer Science+Business Media New York 1988

Authors and Affiliations

  • T. I. Selinder
    • 1
  • G. Larsson
    • 1
  • U. Helmersson
    • 1
  • P. Olsson
    • 1
  • J.-E. Sundgren
    • 1
  • S. Rudner
    • 2
  • L. D. Wernlund
    • 2
  1. 1.The Thin Film Group, Department of PhysicsLinköping UniversityLinköpingSweden
  2. 2.FOA 3LinköpingSweden

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