Photoelectron Spectroscopy Model Study of the Interface Between Polyimide and Copper
Three different model molecules, representative of selected parts of the polyimide monomer unit, phthalimide (PIM), methyl-phthalimide (MPIM), and benzene-phthalimide (BPIM), were deposited on polycrystalline copper in ultra high vacuum. Both thin films and stable adsorbates of these molecules were studied by means of angle-dependent X-ray photoelectron spectroscopy, XPS(θ). The interaction with the copper surface and the orientation of adsorbates appear to be very different for all three of the model molecules examined. PIM shows a preferential orientation and a pronounced interaction with the Cu surface via the nitrogen atom. MPIM forms a very stable adsorbate with an estimated thickness of 18 Å. The BPIM adsorbate decomposes on the Cu surface, which results in a large loss of nitrogen.
KeywordsCarbonyl Carbon Copper Substrate Model Molecule Polyimide Film Copper Cylinder
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