Real Time Spectroscopic Ellipsometry for Non-Invasive Characterization of Thin Film Growth and Etching
Determination of material properties in real time during preparation or processing is an important problem in materials research. Many technologically relevant thin film materials are fabricated in adverse environments such as plasmas or reactive gases. In these situations, an optical probe is among the few non-invasive methods of real time characterization.
KeywordsDielectric Function Unbiased Estimator Spectroscopic Ellipsometry Damage Layer Thin Film Growth
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