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Real Time Spectroscopic Ellipsometry for Non-Invasive Characterization of Thin Film Growth and Etching

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Nondestructive Characterization of Materials IV

Abstract

Determination of material properties in real time during preparation or processing is an important problem in materials research. Many technologically relevant thin film materials are fabricated in adverse environments such as plasmas or reactive gases. In these situations, an optical probe is among the few non-invasive methods of real time characterization.

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References

  1. J. B. Theeten, Surf. Sci. 96, 275 (1980).

    Article  CAS  Google Scholar 

  2. D. E. Aspnes, Proc. Soc. Photo-Opt. Instrum. Eng. 226, 188 (1981).

    Google Scholar 

  3. R. H. Muller and J. C. Farmer, Rev. Sci. Instrum. 55, 371 (1984).

    Article  CAS  Google Scholar 

  4. Y. Cong, I. An, R. W. Collins, K. Vedam, H. S. Witham, L. J. Pilione, and R. Messier, Proc. 8th Int. Conf. on Thin Films, San Diego CA, April 2-6 1990, Thin Solid Films (in press).

    Google Scholar 

  5. D. E. Aspnes and A. A. Studna, Appl. Opt. 14, 220 (1975).

    Article  CAS  Google Scholar 

  6. J. C. Angus, P. Koidl, and S. Domitz, in: Plasma Deposited Thin Films, edited by J. Mort and F. Jansen, (CRC, Boca Raton FL, 1986), p. 89.

    Google Scholar 

  7. D. E. Aspnes, S. M. Kelso, R. A. Logan, and R. Bhat, J. Appl. Phys. 60, 754 (1986).

    Article  CAS  Google Scholar 

  8. D. E. Aspnes, G. P. Schwartz, G. J. Gualtieri, A. A. Studna, and B. Schwartz, J. Electrochem. Soc. 128, 590 (1981).

    Article  CAS  Google Scholar 

  9. A. Gheorghiu and M.-L. Theye, Philos. Mag. B 44, 285 (1981).

    Article  CAS  Google Scholar 

  10. R. W. Collins, J. Vac. Sci. Technol. A7, 1378 (1989).

    Google Scholar 

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Author information

Authors and Affiliations

  1. Materials Research Laboratory, The Pennsylvania State University, University Park, Pennsylvania, 16802, USA

    R. W. Collins, Ilsin An, Yue Cong, A. R. Heyd, H. S. Witham, R. Messier & K. Vedam

Authors
  1. R. W. Collins
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  2. Ilsin An
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  3. Yue Cong
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  4. A. R. Heyd
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  5. H. S. Witham
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  6. R. Messier
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  7. K. Vedam
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Editor information

Editors and Affiliations

  1. Pennsylvania State University, University Park, Pennsylvania, USA

    Clayton O. Ruud

  2. National Research Council of Canada, Industrial Materials Institute, Boucherville, Quebec, Canada

    Jean F. Bussière

  3. The Johns Hopkins University, Baltimore, Maryland, USA

    Robert E. Green Jr.

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© 1991 Springer Science+Business Media New York

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Collins, R.W. et al. (1991). Real Time Spectroscopic Ellipsometry for Non-Invasive Characterization of Thin Film Growth and Etching. In: Ruud, C.O., Bussière, J.F., Green, R.E. (eds) Nondestructive Characterization of Materials IV. Springer, Boston, MA. https://doi.org/10.1007/978-1-4899-0670-0_5

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  • DOI: https://doi.org/10.1007/978-1-4899-0670-0_5

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4899-0672-4

  • Online ISBN: 978-1-4899-0670-0

  • eBook Packages: Springer Book Archive

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