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Quantum Wires and Dots: The Challenge to Fabrication Technology

  • S. P. Beaumont
Part of the NATO ASI Series book series (NSSB, volume 281)

Abstract

In these lectures I will argue that the fabrication of quantum dots and wires for optical applications presents the severest challenge to semiconductor nanotechnology. The dimensional requirements of these structures coincide with a variety of limitations in lithography and pattern transfer processes which are either fundamental or show few signs of being overcome. As a result, researchers in this field are seeking alternative, novel and in some cases bizarre ways of making quantum structures which raise important questions about our approach to device fabrication and bring microelectronics directly into the realm of molecular electronics and related issues.

Keywords

Quantum Wire Electron Beam Lithography Spherical Aberration Chromatic Aberration Luminescence Efficiency 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer Science+Business Media New York 1991

Authors and Affiliations

  • S. P. Beaumont
    • 1
  1. 1.Nanoelectronics Research Centre Department of Electronics and Electrical EngineeringUniversity of GlasgowGlasgowUK

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