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Thin Film Deposition Techniques

  • Kasturi Lal Chopra
  • Suhit Ranjan Das

Abstract

As already pointed out in Chapter 1, a deposition technique and its associated process parameters have a characteristic effect on the nucleation- and growth-dominated microstructure of a thin film and thereby on its physical properties. Two-dimensional materials of thicknesses ranging from angstroms to hundreds of micrometers can be prepared by a host of so-called thin film as well as thick film techniques. The latter methods involve the preparation of thin materials from a paste or liquid form of the bulk material. The two sets of techniques yield thin film materials of widely different microstructures and properties.

Keywords

Solar Cell Chemical Vapor Deposition Substrate Temperature Deposition Rate Glow Discharge 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer Science+Business Media New York 1983

Authors and Affiliations

  • Kasturi Lal Chopra
    • 1
  • Suhit Ranjan Das
    • 2
  1. 1.Indian Institute of TechnologyNew DelhiIndia
  2. 2.National Research CouncilOttawaCanada

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