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Surface Diffusion pp 45–60Cite as

Effects of Lattice Steps on Diffusion and Epitaxial Growth

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Part of the book series: NATO ASI Series ((NSSB,volume 360))

Abstract

Lattice steps are the integral part of a surface. A lattice step can act as a diffusion barrier, an atom-trap-boundary, as well as a diffusion guide for surface atoms. The behavior of atoms at and near step edges plays an important role in epitaxial growth and surface morphology of thin films and also the dynamic behavior of the surface at elevated temperature. We will discuss how atoms move and bind at step edges, how atoms can diffuse across and along lattice steps, and how these atomic processes can affect the growth process and the structure in thin film epitaxy.

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Author information

Authors and Affiliations

  1. Institute of Physics, Academia Sinica, Taipei, 11529, Taiwan, ROC

    Tien T. Tsong

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  1. Tien T. Tsong
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Editor information

Editors and Affiliations

  1. Iowa State University, Ames, Iowa, USA

    M. C. Tringides

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© 1997 Springer Science+Business Media New York

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Tsong, T.T. (1997). Effects of Lattice Steps on Diffusion and Epitaxial Growth. In: Tringides, M.C. (eds) Surface Diffusion. NATO ASI Series, vol 360. Springer, Boston, MA. https://doi.org/10.1007/978-1-4899-0262-7_4

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  • DOI: https://doi.org/10.1007/978-1-4899-0262-7_4

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4899-0264-1

  • Online ISBN: 978-1-4899-0262-7

  • eBook Packages: Springer Book Archive

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