Kinetic Roughening During Ag Homoepitaxy
Kinetic roughening during homoepitaxial growth was studied for Ag(111) and Ag(001) where the two orientations represent opposite limits of step-ledge barrier effects. We summarize recent x-ray specular reflectivity studies of the rms surface roughness which was investigated as a function of thickness and temperature. In addition to exponents, the roughness magnitude, its relationship to step-ledge barrier effects, and the absence of noise in the deposition flux are discussed. Preliminary results are also reported for the lateral coarsening of Ag(111) at 200K.
KeywordsDeposition Flux Intensity Oscillation Kinetic Monte Carlo Simulation Homoepitaxial Growth Kinetic Roughen
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