Kinetic Roughening During Ag Homoepitaxy

  • W. C. Elliott
  • P. F. Miceli
  • T. Tse
  • P. W. Stephens
Part of the NATO ASI Series book series (NSSB, volume 360)

Abstract

Kinetic roughening during homoepitaxial growth was studied for Ag(111) and Ag(001) where the two orientations represent opposite limits of step-ledge barrier effects. We summarize recent x-ray specular reflectivity studies of the rms surface roughness which was investigated as a function of thickness and temperature. In addition to exponents, the roughness magnitude, its relationship to step-ledge barrier effects, and the absence of noise in the deposition flux are discussed. Preliminary results are also reported for the lateral coarsening of Ag(111) at 200K.

Keywords

Deposition Flux Intensity Oscillation Kinetic Monte Carlo Simulation Homoepitaxial Growth Kinetic Roughen 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer Science+Business Media New York 1997

Authors and Affiliations

  • W. C. Elliott
    • 1
  • P. F. Miceli
    • 1
  • T. Tse
    • 2
  • P. W. Stephens
    • 2
  1. 1.Department of Physics and AstronomyUniversity of Missouri-ColumbiaColumbiaUSA
  2. 2.Department of PhysicsState University of New YorkStony BrookUSA

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