PZT Thin Films by Radio Frequency Magnetron Sputtering

  • D. X. Lu
  • E. M. W. Wong
  • E. Y. B. Pun
  • P. S. Chung
  • G. C. Jia

Abstract

Pb(ZrxT1-x)O3 (or PZT) thin films have been deposited on [110] LiTaO3 single crystal substrates by radio frequency magnetron sputtering using a ceramic target with excess PbO. Highly oriented [101] PZT thin films were obtained when the as-deposited thin films were annealed at 650°C for 60 min in an oxygen ambient, and a well-developed grain structure was formed. The optical properties of these thin films were also studied.

Keywords

Pulse Laser Deposition Metalorganic Chemical Vapor Deposition Radio Frequency Magnetron Ceramic Target Radio Frequency Magnetron Sputtering 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer Science+Business Media New York 1997

Authors and Affiliations

  • D. X. Lu
    • 1
  • E. M. W. Wong
    • 1
  • E. Y. B. Pun
    • 1
  • P. S. Chung
    • 1
  • G. C. Jia
    • 2
  1. 1.Department of Electronic EngineeringCity University of Hong KongKowloonHong Kong
  2. 2.Department of ChemistryThe Hong Kong University of Science and TechnologyHong Kong

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