Abstract
The influence of thickness on the orientational dependence of critical current density J c of NbTi thin films has been studied experimentally. The thickness, d, of the films investigated are 26 mn, 35 nm, 50 nm, and 120 nm. Measurements of J c as a function of the amplitude and orientation of the magnetic field B with respect to the film plane are performed at 4.2 K. It is found that the orientational dependence of J c clearly changes from a simple behavior to a more complex one with increasing the thickness of the films. The ratio of J c for perpendicular and parallel film orientation is empirically seen to increase as d 1/2 . The parallel field dependence of J c is qualitatively described using the theoretical expressions derived by Mawatari and Yamafuji.
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© 1998 Springer Science+Business Media New York
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Takeda, M., Nishigaki, K., Toda, H. (1998). Influence of Thickness on Orientational Dependence of Critical Current Density of NbTi Thin Films. In: Balachandran, U.B., Gubser, D.G., Hartwig, K.T., Reed, R.P., Warnes, W.H., Bardos, V.A. (eds) Advances in Cryogenic Engineering Materials . Advances in Cryogenic Engineering, vol 44. Springer, Boston, MA. https://doi.org/10.1007/978-1-4757-9056-6_113
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DOI: https://doi.org/10.1007/978-1-4757-9056-6_113
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