Abstract
It is known to those familiar with parylene that it is has very unique deposition kinetics. The deposition rate increases as the substrate temperature is decreased, which is the opposite of most CVD reactions. The deposition rate increases as the monomer pressure in the chamber is increased, which is more typical of a CVD reaction. It is also known that there is a minimum pressure below which no deposition occurs. This pressure increases (decreases) as substrate temperature increases (decreases). Before more information is presented on parylene kinetic models it is important to have an overview of CVD kinetics in general.
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© 2004 Springer Science+Business Media New York
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Fortin, J.B., Lu, TM. (2004). Deposition Kinetics for Polymerization via the Gorham Route. In: Chemical Vapor Deposition Polymerization. Springer, Boston, MA. https://doi.org/10.1007/978-1-4757-3901-5_5
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DOI: https://doi.org/10.1007/978-1-4757-3901-5_5
Publisher Name: Springer, Boston, MA
Print ISBN: 978-1-4419-5413-8
Online ISBN: 978-1-4757-3901-5
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