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Use of a Microbalance for the Determination of the Mass of Oxygen Reacting during the Oxidation of Thin Films of Binary Alloys

  • M. Boudeulle
  • D. Durand
  • P. Michel
Conference paper

Abstract

The evolution of thin metallic layers during the oxidation processes is studied by means of electron diffraction. Comparison with known compounds, previously obtained in the bulk state, enables determination of the formula and hence the structure of the new compounds, The authors have tried to find the chemical formula of such products — in this case oxides of binary alloys — in a more scientific way. For this purpose they used a microbalance to determine directly, first the mass of the thin metallic layers and then the mass of oxygen reacting on them.

Keywords

Electron Diffraction Binary Alloy Contamination Layer Thin Glass Plate NiFe2 Alloy 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

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    L. Cahn and H. Schultz, Vacuum Microbalance Techniques, Vol. 3, Plenum Press, New York (1963), p. 29.Google Scholar
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    L. Calm and H. Schultz, Anal. Chem., 35, 1729 (1963).CrossRefGoogle Scholar
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    O. M. Katz and E. A. Gulbransen, Vacuum Microbalance Techniques, Vols. 1 and 4, Plenum Press, New York ( 1961, 1964 ).Google Scholar
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    G. D. Scott, T. A. McLauchlan, and R. S. Sennett, J. Appl. Phys., 21, 843 (1950).CrossRefGoogle Scholar
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    F. Martin, Diplôme d’Études Supérieures, Lyon (1968).Google Scholar

Copyright information

© Plenum Press, New York 1970

Authors and Affiliations

  • M. Boudeulle
    • 1
  • D. Durand
    • 1
  • P. Michel
    • 1
  1. 1.Laboratoire de MineralogieLyonFrance

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