Abstract
The protection of optically critical surfaces against the effects of particle contamination by means of transparent barriers has been a long-established approach applied to a broad range of cases, ranging from combustion monitoring(1) to space-borne(2) sensing. Such protective transparent barriers can take the form of cleanable windows, as in the case of the rather prosaic automotive windshield/wiper, or of flow screens, typified by the clean-air curtains incorporated in several types of gas(1) and aerosol(3) monitoring instruments.
Shadow is the diminution of light by the intervention of an opaque body. Shadow is the counterpart of the luminous rays which are cut off by an opaque body.
A shadow may be infinitely dark, and also of infinite degrees of absence of darkness.
Leonardo da Vinci
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References
P. Tomic, New Concepts of Optical Windows in Process Streams, GCA Final Report on U.S. Environmental Protection Agency Contract No. 68–02-3168 Work Assignment No. 109 (April, 1984), 25 pp. Available from GCA/Technology Div., Bedford, Mass.
S.A. Hoenig, Electrostatic dust protection for optical elements, Appl. Optics27(3), 565–569 (1982).
P. Lilienfeld, High concentration dust mass monitor, Particulate Sci. Technol.7, 91–100 (1983).
K. Jain, Laser applications in semiconductor microlithography, Lasers and Applications2(9), 49–56 (1983).
G. Pircher, Submicron lithography, in: Proceedings of 9th International Vacuum Conference and 5th International Conference on Solid Surfaces, Madrid (Sept. 26–Oct. 1, 1983), pp. 427–444.
D. J. Elliott, Integrated Circuit Fabrication Technology, McGraw-Hill Book Company, New York (1982).
J. Roussel, Step and repeat wafer imaging, SPIE Proceedings on Developments in Semiconductor Microlithography III135, 30–35 (1978).
G. L. Resor and A. C. Tobey, The role of direct step-on-the-wafer in microlithography strategy for the 80’s, Solid State Technol.22(9), 101–108 (1979).
V. Miller and H. L. Stove, Submicron optical lithography: I-Line wafer stepper and photoresist technology, Solid State Technol.28(1), 127–136 (1985).
H. B. Lovering, Optics in Microelectronics, Kodak Publication G-45 (1975), pp. 66–71.
T. L. Hershey, Pellicles on wafer steppers with lenticular optics, Solid State Technol.26(7), 89–94 (1983).
A. C. Tobey, Semiconductor microlithography through the eighties, Microelectronic Manufact. Testing8(4), 19–20 (1985).
D. J. Elliott, Integrated Circuit Mask Technology, McGraw-Hill Book Company, New York (1985).
R. M. Shoho, Fabrication of microelectronics reticles, Solid State Technol.22(2), 75–79 (1979).
J. J. Greed, Photomask and reticle making for VLSI, Microelectronic Manufact. Testing6(7), 22–24 (1983).
P. H. Singer, Photomask and reticle defect detection, Semiconductor International8(4), 66–73 (1985).
C. M. Osburn, Aerosol control in semiconductor manufacturing, paper presented at the First International Aerosol Conference, Minneapolis, Minn. (September 17–21, 1984). Extended abstract in: Aerosols—Science, Technology and Industrial Applications of Airborne Particles (B. Y. H. Liu, D. Y. H. Pui, and H. J. Fissan, eds.), p. 673, Elsevier, New York (1984).
P. S. Burggraaf, Reduction reticle trends: Emphasizing 5 ×, Semiconductor International 7(8), 58–63 (1984).
G. Abraham and G. Bergasse, Projection Printing System with an Improved Mask Configuration, U.S. Patent 04063812 (December 20, 1977).
V. Shea and W. J. Wojcik, Pellicle Cover for Projection Printing System, U.S. Patent 04131363 (December 26, 1978).
W. H. Steel, Etude des effets combinés des aberrations et d’une obturation centrale de la pupille sur le contraste des images optiques, Revue Optique32(1), 4–26 (1953).
W. H. Steel, The defocused image of sinusoidal gratings, Optica Acta3(2), 65–74 (1956).
H. H. Hopkins, The frequency response of a defocused system, Proc. Royal Soc. A231, 91–103 (1955).
A. Flamholz, An analysis of pellicle parameters for step-and-repeat projection, Proceedings of SPIE on Optical Microlithography III470, 138–146 (1984).
R. Hershel, Pellicle protection of IC masks, Semiconductor International4(8), 97–106 (1981).
R. Winn and R. Turnager, Pellicles—an industry overview, Solid State Technol.25(6), 41–43 (1982).
R. Iscoff, Pellicles—a means to increase die yield, Semiconductor International5(9), 95–108 (1982).
T. A. Brunner, C. P. Ausschnitt, and D. L. Duly, Pellicle mask protection for 1:1 projection lithography, Solid State Technol.26(5), 135–143 (1983).
A. Rangappan and C. Kao, Yield improvement with pellicalised masks in projection printing technology, Proceedings of SPIE on Optical Microlithography—Technology for the Mid-1980s334, 52–57 (1982).
R. Iscoff, Pellicles 1985: An update, Semiconductor International8(4), 110–115 (1985).
P. S. Burggraaf, Wafer steppers: Considering the issues, Semiconductor International5(4), 57–78 (1982).
R. Turnage and R. Winn, Attaching pellicles to photomasks in a production environment, Microelectronic Manufact. Testing6(1), 31–32 (1983).
I. E. Ward and D. L. Duly, A broadband, deep UV pellicle for 1:1 scanning projection and step and repeat lithography, Proceedings of SPIE on Optical Microlithography III470, 147–156 (1984).
J. Lent and S. Swayne, The Implementation of a Pellicle Mask Protection System into an Established Production Area, Kodak Publication G-136 (1982), pp. 93–99.
J. Lent, Pellicle mask protection for 1:1 projection aligners, Motorola Technical Developments2, 22–23 (1982).
K. W. Edmark and G. Quackenbos, An American assessment of Japanese contamination-control technology, Microcontamination2(5), 47–53, 125 (1984).
R. L. Ruddell, Resist and mask trends, Semiconductor International7(7), 104–108 (1984).
I. E. Ward and P. M. Papoojian, Pellicle Compositions and Pellicles Thereof for Projection Printing, U.S. Patent 04499231 (February 12, 1985).
I. E. Ward, Polyvinyl Butyrate Pellicle Compositions and Pellicles Thereof for Projection Printing, U.S. Patent 04482591 (November 13, 1984).
I. E. Ward, Pellicle Compositions and Pellicles Thereof for Projection Printing, U.S. Patent 04476172 (October 9, 1984).
Micropel Products Bulletin, EKC Technology, Inc., Hayward, Calif.
Advanced Semiconductor Products Data Sheet No. 109, Santa Cruz, Calif. (June 9, 1982).
D. L. Duly, H. Windischmann, and W. D. Buckley, Method of Fabricating a Pellicle Cover for Projection Printing System, U.S. Patent 4465759 (August 14, 1984).
P. R. Carafe and J. R. Kraycir, Photomask pellicle support ring design, IBM Technical Disclosure Bulletin27(1B), 769 (1984).
D. W. Fisher, V. Shea, P. Trongo, and W. Wojcik, Transparent ring for low angle pellicle inspection, IBM Technical Disclosure Bulletin23(2), 526 (July, 1980).
C. M. Walwyn and D. E. Bohonos, Pellicle Mounting Fixture, U.S. Patent 04443098 (April 17, 1984).
A. B. Patel and E. Wojciekfsky, Mounting of mask with pellicle, IBM Technical Disclosure Bulletin26(8), 4036–4037 (1984).
Y. Yen, Dustfree Packaging Container and Method, U.S. Patent 04470508 (September 11, 1984).
Tau Laboratories, Inc., Products Bulletin (1982), Riddings, Derby, England.
A. K. M. Miller and R. Mason, Container for Masks and Pellicles, U.S. Patent 4511038 (April 16, 1985).
J. W. Conant, Pellicle Ring Removal Method and Tool, U.S. Patent 04255216 (March 10, 1981).
P. Chipman, Qualifying reduction reticles, Semiconductor International7(8), 68–73 (1984).
P. S. Burggraaf, 1 x Mask and reticle technology, Semiconductor International6(3), 40–45 (1983).
R. A. Simpson and D. E. Davis, Detecting submicron pattern defects on optical photomasks using an enhanced EL-3 electron-beam lithography tool, Proceedings of SPIE on Optical Microlithography—Technology for the Mid-1980s334, 230–237 (1982).
G. Quackenbos, S. Broude, and E. Chase, Automatic detection and quantification of contaminants on reticles for semiconductor microlithography, Proceedings of SPIE on Integrated Circuit Metrology342, 35–43 (1982).
M. Shiba, M. Koizumi, and T. Katsuta, Automatic inspection of contaminants on reticles, Proceedings of SPIE on Optical Microlithography III470, 233–239 (1984).
A. Tanimoto and K. Imamura, Reticle contamination monitor for a wafer stepper, Proceedings of SPIE on Optical Microlithography III470, 242–249 (1984).
K. L. Mittal, ed., Surface Contamination: Genesis, Detection and Control, Vols. 1 and 2, Plenum Press, New York (1979).
P. Lilienfeld, Optical detection of particle contamination on surfaces—a Review, Aerosol Sci. Technol.5(2), 145–165 (1986).
L. McVay and P. Lilienfeld, Automatic Detector for Microscopic Dust on Large-Area Optically Unpolished Surfaces, U.S. Patent No. 4402607 (September 6, 1983).
E. T. Chase, S. V. Broude, and G. S. Quackenbos, Surface Inspection Apparatus, U.S. Serial No. 682794 patent pending (filed December 18, 1984).
R. V. Asselt and G. Brooks, Technique for Inspecting Photomasks with Pellicles Attached, Kodak Publication G-136 (1982), pp. 158–162.
C. P. Ausschnitt, T. A. Brunner, and S. C. Yang, Application of wafer probe techniques to the evaluation of projection printers, Proceedings of SPIE on Optical Microlithography—Technology for the Mid-1980s334, 17–25 (1982).
G. Bouwhuis and J. J. M. Braat, Video disk player optics, Appl. Optics17(13), 1993–2000 (1978).
G. C. Kenney, D. Y. K. Low, R. McFarlane, A. Y. Chan, J. S. Nadan, T. R. Kohler, J. G. Wagner, and F. Zernike, An optical disk replaces 25 mag tapes, IEEE Spectrum16(2), 33–38 (1979).
D. C. Kowalski, D. J. Curry, L. T. Klinger, and G. Knight, Multichannel digital optical disk memory system, Optical Eng.22(4), 464–472 (1983).
R. McFarlane, G. Blom, A. Chan, S. Chandra, E. Frankfort, G. Kenney, D. Low, and J. Nadan, Digital optical recorders at Mbit/s data rate, Optical Eng.21(5), 913–922 (1982).
S. Miyaoka, Digital audio is compact and rugged, IEEE Spectrum21(3), 35–39 (1984).
J. Hecht, Optical memory for personal computers, Lasers and Applications4(8), 71–76 (1985).
H. Brody, Materials for optical storage: A state-of-the-art survey, Laser Focus17(8), 47–52 (1981).
M. Hartmann, J. Braat, and B. Jacobs, Erasable magneto-optical recording media, IEEE Trans. Magn.20(5), 1013–1018 (1984).
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© 1987 Plenum Press, New York
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Lilienfeld, P. (1987). Application of Pellicles in Clean Surface Technology. In: Mittal, K.L. (eds) Treatise on Clean Surface Technology. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-9126-5_13
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DOI: https://doi.org/10.1007/978-1-4684-9126-5_13
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