Skip to main content

Abstract

High power rectifiers and thyristors are generally fabricated with float zone silicon material. The resistivity variations of this type of material produce non-uniform electrical characteristics from device to device, especially in blocking voltage, forward voltage drop, and switching characteristics. Large area NTD (neutron transmutation doped) silicon1 has become available from different suppliers since 1975. This type of silicon has a narrow range of resistivity across the whole area. During the last few years, we have evaluated and manufactured 50mm to 67mm diameter high resistivity NTD silicon for high power devices. Devices fabricated from this type of material resulted in a higher voltage distribution and a narrower distribution of electrical characteristics.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Chapter
USD 29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD 39.99
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD 54.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. M. Tanenbum and A. D. Mills, J. Electrochem Soc., 108, 171, (1961).

    Article  Google Scholar 

  2. C. K. Chu, J. E. Johnson, and W. H. Karstaedt, The Impact of NTD Silicon on High Power Thyristors and Applications, IAS Paper, 27-D, 1977.

    Google Scholar 

  3. C. K. Chu, J. Bartko, and P. E. Felice, “Electron Radiated Fast Switch Power Thyristor, 1975 Annual IAS Meeting Record, 75CH0999–31A, p 180.

    Google Scholar 

  4. C. K. Chu and J. E. Donlon, “Annealing Effects on Electron Irradiated and Gold Diffused Thyristors for Fast Switch Application, 1976 IEEE-IAS Meeting Record, 76CH1122–1–1A, p 51.

    Google Scholar 

  5. K. Platzoder and K. Loch, IEEE Trans. Electron Devices, ED-23, No. 8, August 1976.

    Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Editor information

Editors and Affiliations

Rights and permissions

Reprints and permissions

Copyright information

© 1979 Plenum Press, New York

About this chapter

Cite this chapter

Chu, C.K., Johnson, J.E. (1979). NTD Silicon on High Power Devices. In: Meese, J.M. (eds) Neutron Transmutation Doping in Semiconductors. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-8249-2_6

Download citation

  • DOI: https://doi.org/10.1007/978-1-4684-8249-2_6

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4684-8251-5

  • Online ISBN: 978-1-4684-8249-2

  • eBook Packages: Springer Book Archive

Publish with us

Policies and ethics