Skip to main content

Measurements of 3 1P Concentrations Produced by Neutron Transmutation Doping of Silicon

  • Chapter
Neutron Transmutation Doping in Semiconductors

Abstract

The absolute concentrations of 3 1P, produced by the irradiations of float zone silicon samples in the Texas A§M University Research Reactor, have been measured to an accuracy of ± 10%. The neutron fluence was varied from 1016 to 1018n/cm2, which corresponded to 3 1P concentrations in the 1012 to 1014 atoms/cm3 range. The results are based on measurements of the absolute activities of 3 1Si by detection of 1.266 MeV gamma rays. Secondary standards of Fe were required for the larger neutron fluences. The 3 lp concentrations were compared to the concentrations of electrically active P following 850°C anneals for 1 hour. These concentrations were determined in the same samples from temperature-dependent Hall effect measurements at Hughes Research Laboratories. The two results agree to within experimental error, thus confirming that transmuted P in the 1012 to 1014 atoms/cm3 range is completely electrically active following 850°C, 1 hour anneals of float zone silicon. In addition, a corrected value for the gamma abundance of31Si was established to be 5.6 x 10-4 ± 10%.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Chapter
USD 29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD 39.99
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD 54.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. H. Herzer, Proceedings of the Third International Symposium on Silicon Materials Science and Technology, edited by H. R. Huff and E. Sirtl (The Electrochemical Society, Inc., Princeton, N. J., 1977), p. 106 and references therein.

    Google Scholar 

  2. Hans Mork Janus and Olof Malmros, IEEE Transactions on Electron Devices, ED-23, 797 (1976).

    Google Scholar 

  3. Ernst W. Haas and Manfred S. Schnoller, IEEE Transactions on Electron Devices, ED-23, 803 (1976).

    Google Scholar 

  4. W. S. Lyon and J. J. Manning, Phys. Rev. 93, 501 (1954).

    Article  Google Scholar 

  5. M. H. Young, O. J. Marsh, and R. Baron, J. Appl. Phys., to be published.

    Google Scholar 

  6. S. F. Mughabghab and D. I. Garber, BNL-325 (1973).

    Google Scholar 

  7. W. W. Bowman and K. W. MacMurdo, Atomic Data and Nuclear Data Tables 13, 89 (1974).

    Article  Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Editor information

Editors and Affiliations

Rights and permissions

Reprints and permissions

Copyright information

© 1979 Plenum Press, New York

About this chapter

Cite this chapter

Hart, R.R., Albert, L.D., Skinner, N.G., Young, M.H., Baron, R., Marsh, O.J. (1979). Measurements of 3 1P Concentrations Produced by Neutron Transmutation Doping of Silicon. In: Meese, J.M. (eds) Neutron Transmutation Doping in Semiconductors. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-8249-2_28

Download citation

  • DOI: https://doi.org/10.1007/978-1-4684-8249-2_28

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4684-8251-5

  • Online ISBN: 978-1-4684-8249-2

  • eBook Packages: Springer Book Archive

Publish with us

Policies and ethics