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High Precision Irradiation Techniques for NTD Silicon at the University of Missouri Research Reactor

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Neutron Transmutation Doping in Semiconductors

Abstract

The design factors which governed the construction of present NTD irradiation facilities at MURR were efficient utilization of reflector space, good doping accuracy, good doping uniformity, and potential for growth. The present MURR flux integration system will be described. This system consists of 1.5 mm diameter, self- powered neutron detectors and high precision analogue current integrators. These are utilized at each sample position to achieve an overall fluence accuracy of better than ± 1%. The integration system is used to determine the 50% of total fluence point at which samples are flipped end-for-end. This technique, as opposed to flux flattening or sample spiraling, provides a very efficient utilization of reflector space without compromising axial uniformity. Axial uniformity obtainable in any position is better than ± 4% of target over sample lengths of 250 mm. Sample rotators are used to obtain radial uniformity of better than ± \% up to 86 mm diameter. Present irradiation positions consist of two 750 mm long x 85 mm diameter, two 750 mm long x 60 mm diameter, seven 750 mm long x 80 mm diameter, and a high precision variable flux facility. The present MURR capacity is of the order of 15–20 ppb-tonnes per year.

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References

  1. H. M. Janus, IEEE Trans. Electron. Devices ED-23, 797 (1976).

    Article  Google Scholar 

  2. J. M. Meese, this conference.

    Google Scholar 

  3. B. D. Stone, D. B. Hines, S. L. Gunn and D. McKown, this conference.

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  4. R. Berliner and S. Wood, this conference.

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  5. J. M. Meese, Silicon Detector Compensation by Nuclear Transmutation, Final Technical Report AFML-TR-77–178, Air Force Materials Laboratory, (1978).

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  6. Reuter Stokes, 18532 S. Miles Parkway, Cleveland, Ohio, 44128.

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  7. Brookhaven Instrument Corporation, Box 3136, Austin, TX.

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  8. D. E. Cullen and P. J. Hlavac, ENDF/B Cross Sections, Brook- haven National Laboratory, Upton, NY (1972).

    Google Scholar 

  9. A.S.T.M. Standard F84–73, 1916 Race Street, Phil., PA.

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© 1979 Plenum Press, New York

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Gunn, S.L., Meese, J.M., Alger, D.M. (1979). High Precision Irradiation Techniques for NTD Silicon at the University of Missouri Research Reactor. In: Meese, J.M. (eds) Neutron Transmutation Doping in Semiconductors. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-8249-2_16

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  • DOI: https://doi.org/10.1007/978-1-4684-8249-2_16

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4684-8251-5

  • Online ISBN: 978-1-4684-8249-2

  • eBook Packages: Springer Book Archive

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