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The Kapitza Resistance between Cu(Cr) and 4He(3He) Solutions and Applications to Heat Exchangers

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Low Temperature Physics-LT 13

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Abstract

Anderson and Johnson1 have measured the Kapitza resistance between liquid 3He and copper for the same copper surface in both the work-hardened and annealed states. Below 0.2°K the Kapitza resistance of work-hardened copper was found to be ten times smaller than that of annealed copper. This result probably explains the high Kapitza resistivities measured in dilution refrigerator heat exchangers compared to previous resistivity measurements on unannealed bulk copper.2 High-surface-area copper heat exchangers are generally sintered together at temperatures high enough to completely anneal copper.

Contribution of the National Bureau of Standards, not subject to copyright.

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References

  1. A.C. Anderson and W.L. Johnson, J. Low Temp. Phys. 7, 1 (1972).

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  2. J.C. Wheatley, R.E. Rapp, and R.T. Johnson, J. Low Temp. Phys. 4, 1 (1971).

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  3. P.D. Thatcher, Phys. Rev. 156, 975 (1967); J.K. Wigmore, Phys. Lett. 37A, 293 (1971).

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  4. H. Haug and K. Weiss, presented at the 4th Intern. Cryogenic Engineering Conf. Eindhoven Univ., The Netherlands (to be published).

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  5. W.D. Robertson and R.S. Bray, Precipitation from Solid Solution, American Society of Metals, Cleveland, Ohio (1959), p. 328.

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  6. A.F. Clark, G.E. Childs, and G.H. Wallace, Cryogenics 10, 295 (1970).

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Author information

Authors and Affiliations

  1. Cryogenics Division, NBS Institute for Basic Standards, Boulder, Colorado, USA

    J. D. Siegwarth & R. Radebaugh

Authors
  1. J. D. Siegwarth
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  2. R. Radebaugh
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Editors and Affiliations

  1. University of Colorado, Boulder, Colorado, USA

    K. D. Timmerhaus  & W. J. O’Sullivan  & 

  2. National Science Foundation, Washington, D.C., USA

    K. D. Timmerhaus

  3. Los Alamos Scientific Laboratory, University of California, Los Alamos, New Mexico, USA

    E. F. Hammel

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© 1974 Springer Science+Business Media New York

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Siegwarth, J.D., Radebaugh, R. (1974). The Kapitza Resistance between Cu(Cr) and 4He(3He) Solutions and Applications to Heat Exchangers. In: Timmerhaus, K.D., O’Sullivan, W.J., Hammel, E.F. (eds) Low Temperature Physics-LT 13. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-7864-8_81

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  • DOI: https://doi.org/10.1007/978-1-4684-7864-8_81

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4684-7866-2

  • Online ISBN: 978-1-4684-7864-8

  • eBook Packages: Springer Book Archive

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