Abstract
An ever increasing research effort has been devoted to the low pressure and temperature deposition of thin diamond films, since its realization has been proved and widely confirmed in the last few years. The reason for this may be largely related to the expectation for a wide set of potential applications, ranging from diamond protective coatings, to heat sinks, to optical and semiconductor devices, all of them exploiting in some way the unique combination of mechanical, optical, thermal, chemical, and electrical properties of diamond.1 Moreover, recent progress in the processing of diamond and diamond-like carbon coatings has already resulted in development and commercial success.2
ENIRicerche Fellowship.
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© 1991 Plenum Press, New York
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Ascarelli, P. et al. (1991). Diamond Crystal Growth by Hot Filament CVD and Its Characterization. In: Clausing, R.E., Horton, L.L., Angus, J.C., Koidl, P. (eds) Diamond and Diamond-like Films and Coatings. NATO ASI Series, vol 266. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-5967-8_49
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DOI: https://doi.org/10.1007/978-1-4684-5967-8_49
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