In Situ Plasma and Surface Diagnostics of C:H Deposition from ECR Plasmas

Abstract

In order to afford a better understanding of the deposition of C:H films from plasmas heated by the electron-cyclotron-resonance (ECR) both plasma and surface diagnostics are employed. Important parameters as film thickness and refractive index, plasma density and plasma composition are measured by means of in situ and non-intrusive techniques using microwaves and visible light. A two-beam laser interferometer independently monitors film thicknesses and refractive indices during the deposition process. In this way deposition rates can be evaluated. The line integral of the electron density is evaluated from phase shift measurements using a 35 GHz microwave interferometer. Furthermore, optical spectroscopy in the visible spectral region is used as a plasma probe.