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High Tc Y-Ba-Cu-O Films Prepared by Multilayer, Reactive Sputtering from Separate Y, Cu, and Ba0.5Cu0.5 Targets

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Science and Technology of Thin Film Superconductors

Abstract

In order to thoroughly investigate the phase diagram in films, and to perform destructive tests (e.g. various annealing procedures), a set (nearly ninety) of films having a composition YxBa2CuyOz with 0.6 < x < 1.9 and 2.5 < y < 4.5 (centered around the Y1Ba2Cu3O7-δ compound in the ternary phase diagram) were prepared on MgO. Multilayer deposition of the constituents at ambient temperature was performed by reactive de-maguetron sputtering from separate Y, Cu, and Ba0.5Cu0.5 targets in an atmosphere of 6×10-5 Tarr O2 and 1.0×10-2 Torr Ar. Two hinds of post-deposition heat treatment were applied: rapid thermal annealing between 950–1000°C and slow annealing between 840–860°C. Superconducting films with Tc (R=0) between 80 K and 90 K were routinely produced by the rapid thermal annealing process, if the stoichiometry lay in the range of 0.9 < x < 1.4 and 3.2 < y < 3.5. The interrelation between stoichiometry, heat treatment, Tc (R=0), chemical reactions with the substrate, and the presence of phases; other than the known 1-2-3 superconductor was explored, Raman spectroscopy was employed to study the latter two properties. A stroug correlation was found between the Raman spectra and Tc (R=0), which suggests the potential utility of Raman scattering as an in-situ probe to characterize the growth of Y-Ba-Cu-O films. We also found that the rapid thermal annealing process is a very efficient way to reduce chemical reactions of the film with its substrate.

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© 1989 Plenum Press, New York

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Lee, S.J. et al. (1989). High Tc Y-Ba-Cu-O Films Prepared by Multilayer, Reactive Sputtering from Separate Y, Cu, and Ba0.5Cu0.5 Targets. In: McConnell, R.D., Wolf, S.A. (eds) Science and Technology of Thin Film Superconductors. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-5658-5_25

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  • DOI: https://doi.org/10.1007/978-1-4684-5658-5_25

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4684-5660-8

  • Online ISBN: 978-1-4684-5658-5

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