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Interface Characterization of GaInAs-InP Superlattices Grown by Low Pressure Metalorganic Chemical Vapor Deposition

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Properties of Impurity States in Superlattice Semiconductors

Part of the book series: NATO ASI Series ((NSSB,volume 183))

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Abstract

Very high quality Ga0.47In0.53 As-InP heterojunctions, quantum wells and superlattices have been grown by low pressure metalorganic chemical vapor deposition (LP-MOCVD). Excitation spectroscopy shows evidence of strong and well resolved exciton peaks in the luminescence and excitation spectra of GalnAs-InP quantum wells. Optical absorption shows roomtemperature exciton in GalnAs-InP superlattices (M. Razeghi et al., 1983)1. Quantum wells as thin as 8 A with a photoluminescence linewidth of 9 meV have been grown.

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© 1988 Plenum Press, New York

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Razeghi, M., Maurel, P., Omnes, F. (1988). Interface Characterization of GaInAs-InP Superlattices Grown by Low Pressure Metalorganic Chemical Vapor Deposition. In: Fong, C.Y., Batra, I.P., Ciraci, S. (eds) Properties of Impurity States in Superlattice Semiconductors. NATO ASI Series, vol 183. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-5553-3_5

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  • DOI: https://doi.org/10.1007/978-1-4684-5553-3_5

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4684-5555-7

  • Online ISBN: 978-1-4684-5553-3

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