Skip to main content

Shallow and Deep Impurity Investigations: The Important Step Towards a Microwave Field-Effect Transistor Working at Cryogenic Temperatures

  • Chapter
Properties of Impurity States in Superlattice Semiconductors

Part of the book series: NATO ASI Series ((NSSB,volume 183))

  • 131 Accesses

Abstract

Current, amplification, output power and frequency limits of field-effect transistors (FETs) are determined by both the carrier concentration and the carrier transport properties (mobility and velocity) in the channel. In GaAs MESFETs the current conducting channel itself is doped with shallow impurities up to levels of 1017 or 1018 cm-3. These high concentrations degrade the mobility.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Chapter
USD 29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD 39.99
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD 54.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. H. Dämbkes, W. Brockerhoff, K. Heime, K. Ploog, G. Weimann, W. Schlapp Electronics Letters, Vol.20, No.15, 1984, 615–618

    Article  ADS  Google Scholar 

  2. C.P. Lee, D. Hou, S.J. Lee, D.L. Miller, R.J. Anderson GaAs IC Symp.Techn.Dig., Oct, 1983

    Google Scholar 

  3. P.C. Chao, S.C. Palmateer, P.M. Smith, U.K. Miskra, D.H.G. Duk, J.C.M. Hwang IEEE Electron Dev.Lett., Vol.EDL-6, No.10, 1985

    Google Scholar 

  4. M.W. Pospialski, S. Weinreb, P.C. Chao, C.K. Mishra, S.C. Palmateer, P.M. Smith, J.C.M. Hwang IEEE Transactions on Electron Devices, Vol. ED-33, No.2, February 1986

    Google Scholar 

  5. A. Kastalsky, R.A. Kiehl Proc.GaAs and Related Compounds 1985

    Google Scholar 

  6. T.J. Drummond, R.J. Fischer, W.F. Kopp, K. Morkoc, K. Lee, M.S. Shur IEEE Electron Dev., Vol.ED-30, No.12, 1983

    Google Scholar 

  7. M. Heuken, L. Loreck, K. Heime, K. Ploog, W. Schlapp, G. Weimann IEEE Electron Devices, ED-33, 693, May 1986

    Article  ADS  Google Scholar 

  8. M. Heuken, J. Kraus, K. Heime, W. Schlapp, G. Weimann Proc. E-MRS, Straßbourg, Spring 1987

    Google Scholar 

  9. L. Loreck, H. Dämbkes, K. Heime, K. Ploog, G. Weimann IEEE Electron Device Lett., Vol. EDL-5, No.1, 1984

    Google Scholar 

  10. D.V. Lang, R.A. Logan, M. Jaros Phys. Rev.B., Vol.19, No.2, 15.January 1979

    Google Scholar 

  11. J.Y. Chi, R.P. Holmstrom, J.P. Salerno IEEE Electron Device Lett., Vol.EDL5, No.9, 1984

    Google Scholar 

  12. R. Bhat, W.K. Chan, A. Kastalsky, M.A. Koza, P.S. Davisson Appl.Phys.Lett. 47(12), 15.Dec. 1985

    Google Scholar 

  13. T. Baba, T. Mizutani, M. Ogawa, K. Ohata Jap. Jornal of Appl.Phys., Vol.23, No.8, 1984

    Google Scholar 

  14. G. Weimann Festkörperprobleme XXVI,(1986)pp 231–250

    Google Scholar 

  15. P.R. Jay, R.H. Wallis IEEE Electron Device Lett., Vol.EDL-2. No.10, Oct. 1981

    Google Scholar 

  16. W. Prost, W. Brockerhoff, K. Heime, K. Ploog, W. Schlapp, G. Weimann, H. Morkoc IEEE Electron Devices, ED-33, May 1986

    Google Scholar 

  17. F.J. Tegude, J. Baston, N. Arnold, K. Heime Proc. 2nd Conf. on Semi-Insulating III-V Materials Evian, Frankreich 1982

    Google Scholar 

  18. F.J. Tegude, K. Heime IEEE Electronics Device Lett., Vol.16, p.22, 1980

    Article  Google Scholar 

  19. K. Yamanaka, S. Naritsuka, M. Mannoh, T. Yussa, M. Mihara, M. Ishii J.Vac. Science & Techn. Vol.2, No.2, 1984

    Google Scholar 

  20. M.O. Watanabe, K. Morizuku, M. Mashita, Y. Ashizawa, Y. Zohta Jap. Journal of Applied Physics, Vol.23, No.2, 1984

    Google Scholar 

  21. T. Ishikawa, T. Yamamoto, K. Kondo, J. Komeno, A. Shibatomi Inst. Phys. Conf. Ser. No.83

    Google Scholar 

  22. D.V. Lang Journal of Applied Physics, Vol.45, No.7, Juli 1974

    Google Scholar 

  23. L. Loreck Dissertation Universität-GH-Duisburg, 1985

    Google Scholar 

  24. K. Hikosaka, T. Mimura, S. Kiyamizu Inst.Phys.Conf. Ser.No. 63, 233–238, 1981

    Google Scholar 

  25. H. Künzel, K. Ploog, K. Wünstel, B.L. Zhon J.Electron.Mat., Vol. 13, No.2 (1984), 281–308

    Article  ADS  Google Scholar 

  26. L. Loreck, H. Dämbkes, K. Heime, K. Ploog, G. Weimann Proc.Noise in Physical Systems, North-Holland Pub.Co., Amsterdam 1983, 261

    Google Scholar 

  27. L. Loreck, H. Dämbkes, K. Ploog, K. Heime IEEE Intern. Electron Devices Metting, 107, 1983

    Google Scholar 

  28. J.M. Dieudonne, M. Pouysegur, J. Graffeuil, J.H. Cazaux, IEEE Trans.Electron Devices, ED-33, 572, 1986

    Article  ADS  Google Scholar 

  29. RJ. Trew, M.A. Khatibzadek, N.A. Masnari, IEEE Trans.Electron Devices, ED-32, 1985

    Google Scholar 

  30. H J. Siweris, B. Schiek, IEEE Trans.Microwave Theory Techniques, MTT-33, 233, 1985

    Article  ADS  Google Scholar 

  31. R.J. Trew, private communications, 1985

    Google Scholar 

  32. T. Baba, T. Mizutani, M. Ogawa Japan J.Appl. Phys. 22 (1983) L627–629

    Article  ADS  Google Scholar 

  33. T. Baba Microelectronic Engineering 4 (1986) 195–206

    Article  Google Scholar 

  34. M. Heuken, W. Prost, S. Kugler, K. Heime, W. Schlapp, G. Weimann Inst. Phys. Conf. Ser. No.83, Chapter 8

    Google Scholar 

  35. R. Fischer, W.T. Masselink, J. Klem, T. Henderson, H. Morkoc Electronics Letters, 30th August 1984, Vol.20, No. 18

    Google Scholar 

  36. C.W. Tu, W.L. Jones, R.F. Kopf, L.D. Urbanek, S.S. Pei IEEE Electron Device Lett.,Vol.7, No.9, 1986

    Google Scholar 

  37. E.F. Schubert and K. Ploog Japanese Journal of Applied Physics, Vol.24, No.8, August 1985

    Google Scholar 

  38. W. Prost, W. Brockerhoff, K. Heime, W. Schlapp, G. Weimann 11th Workshop on Compound Semiconductor Devices and Integrated Circuits, Grainau, FRG, 1987

    Google Scholar 

  39. T. Baba private communication, Oktober 1986

    Google Scholar 

  40. K. Ploog Journal of Crystal Growth 81 (1987) 304–313

    Article  ADS  Google Scholar 

  41. G. Bosman, R.J.J. Zijlstra Sol.State Electronics, 25, (1982), 273,

    Article  ADS  Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Editor information

Editors and Affiliations

Rights and permissions

Reprints and permissions

Copyright information

© 1988 Plenum Press, New York

About this chapter

Cite this chapter

Prost, W. et al. (1988). Shallow and Deep Impurity Investigations: The Important Step Towards a Microwave Field-Effect Transistor Working at Cryogenic Temperatures. In: Fong, C.Y., Batra, I.P., Ciraci, S. (eds) Properties of Impurity States in Superlattice Semiconductors. NATO ASI Series, vol 183. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-5553-3_11

Download citation

  • DOI: https://doi.org/10.1007/978-1-4684-5553-3_11

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4684-5555-7

  • Online ISBN: 978-1-4684-5553-3

  • eBook Packages: Springer Book Archive

Publish with us

Policies and ethics