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Physico-Chemical Basis of Laser Lithography

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Physical Processes in Laser-Materials Interactions

Part of the book series: NATO Advanced Study Institutes Series ((NSSB,volume 84))

Abstract

The modern microelectronics needs new methods for pattern generation, which may ensure higher quality and resolution than the photolithographic method. At the present the X-ray and the electron beam lithography methods are under fast development. The specific properties of the laser radiation make it very effective for pattern generation and the results obtained are comparable with these of the X-ray and the electron beam lithographies.

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Author information

Authors and Affiliations

  1. Faculty of Physics, Sofia University, 1126, Sofia, Bulgaria

    S. M. Metev

Authors
  1. S. M. Metev
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Editor information

Editors and Affiliations

  1. Institute of Physics, University of Rome, Rome, Italy

    M. Bertolotti

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© 1983 Plenum Press, New York

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Metev, S.M. (1983). Physico-Chemical Basis of Laser Lithography. In: Bertolotti, M. (eds) Physical Processes in Laser-Materials Interactions. NATO Advanced Study Institutes Series, vol 84. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-4322-6_27

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  • DOI: https://doi.org/10.1007/978-1-4684-4322-6_27

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4684-4324-0

  • Online ISBN: 978-1-4684-4322-6

  • eBook Packages: Springer Book Archive

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