Abstract
Using off-axis, dc magnetron sputtering we have produced YBa2Cu3O7 (YBCO) and La1.85Sr0.15CuO4 (LSCO) films at temperatures of 650–700°C which have a critical temperature, normal-state conductivity, critical current density, rf surface resistance, c-axis growth orientation, and surface structure comparable to the best films produced by laser ablation, co-evaporation in activated oxygen, or other sputtering techniques. In contrast to the other techniques, off-axis sputtering has simultaneously produced uniform film properties across a 2-inch diameter substrate holder and used stoichiometric oxide targets. The use of stoichiometric targets permitted YBCO films to be easily integrated with other epitaxial oxide films over this relatively large area. Low-energy electron diffraction showed that the 1:2:3 structure was maintained within the length of one unit cell from the film surface for YBCO and PrBa2Cu3O7 (PrBCO) films and multilayers.
Supported in part by AFOSR Contract No. F49620-88-C-0039
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Talvacchio, J., Forrester, M.G., Gavaler, J.R., Braggins, T.T. (1990). YBCO and LSCO Films Grown by Off-Axis Sputtering. In: McConnell, R.D., Noufi, R. (eds) Science and Technology of Thin Film Superconductors 2. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-1345-8_7
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