Abstract
As a reduced thermal budget processing technique, we have used rapid isothermal processing MOCVD for the deposition of Y-Ba-Cu-O (YBCO) films. For further reducing the thermal budget, we have integrated remote plasma and RIP in one chamber. The results presented here, coupled with our capability of depositing YBCO on BaF2/Si substrate, indicate the usefulness of MOCVD for the practical realization of superconductor/semiconductor hybrid and other advanced devices.
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References
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© 1990 Plenum Press, New York
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Singh, R. et al. (1990). Y-Ba-Cu-O Superconducting Thin Films Deposited by Rapid Isothermal Processing MOCVD. In: McConnell, R.D., Noufi, R. (eds) Science and Technology of Thin Film Superconductors 2. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-1345-8_45
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DOI: https://doi.org/10.1007/978-1-4684-1345-8_45
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