Abstract
Preparation of superconducting YBa2Cu3O7−x films was studied using a newly developed low pressure RF-plasma deposition apparatus. The equipment consists of an electrode-free plasma source mounted in a vacuum vessel and connected to a powder feed unit. A mixture of Ar and O2 is used as plasma gas. A second source of the same type generates an oxygen plasma which provides reactive oxygen at the substrate during deposition. The plasma sources operate in the pressure range of 10−2 to 10 mbar, best results are achieved at a pressure of 1 to 2 mbar. Films were deposited on polycrystalline Al2O3 and ZrO2 substrates. The films were characterized by resistivity measurements, scanning electron microscopy, energy dispersive X-ray analysis, and X-ray diffraction. The influence of the deposition parameters and annealing conditions on the film composition, microstructure, and superconductivity will be discussed.
This is a preview of subscription content, log in via an institution to check access.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
J. Geerk, P. Kus, G. Linker, X. X. Xi, H. C. Li, W. Y. Guan, O. Meyer, F. Weschenfelder, Q. Li, B. Egner, R. Smithey, F. Ratzel, and B. Strehlau, in Proceedings of the Conference on the Science and Technology of Thin film Superconductors, edited by R. D. McConnell and S. A. Wolf, Plenum, New York, 1989.
P. Berberich, J. Tate, W. Dietsche, and H. Kinder, Appl. Phys. Lett. 53 (1988) 925.
B. Roas, L. Schultz, and G. Endres, J. Less-Common Metals 151 (1989) 413.
J. Fröhlingsdorf, W. Zander, and B. Stritzker, Solid State Commun. 67 (1988) 965.
J. Kwo, M. Hong, D. J. Trevor, R. M. Fleming, A. E. White, R. C. Farrow, A. R. Kortan, and K. T. Short, Appl. Phys. Lett. 53 (1988) 2683.
F. Schmaderer and G. Wahl, in Proceedings of EURO-CVD 7, Perpignan, France, June 1989.
J. J. Cuomo, C. R. Guarnieri, S. A. Shivashankar, R. A. Roy, D. S. Yee, and R. Rosenberg, Adv. Ceram. Mater. 2 (3B) (1987) 422.
M. Naito, R. H. Hammond, B. Oh, M. R. Hahn, J. W. P. Hsu, P. Rosenthal, A. F. Marshall, M. R. Beasley, T. H. Geballe, and A. Kapitulnik, J. Mater. Res. 2 (1987) 713.
T. Hirai, H. Yamane, H. Kurosawa, K. Watanabe, N. Kobayashi, H. Iwasaki, and Y. Muto, presented at the ISEC’89 Conference, Tokyo, Japan, June 12–13, 1989.
S. Rohr, G. Eckard, I. Bächer, L. Schneider, R. Müller, and H. Vinzelberg, Z. Metallkde 80 (1989) 679.
R. A. Neiser, J. P. Kirkland, H. Herman, W. T. Elam, and E. F. Skelton, Materials Science and Engineering 91 (1987) L13.
G. N. Heintze, R. McPherson, D. Tolino, and C. Andrikidis, J. Mater. Sci. Lett. 7 (1988) 251.
K. Tachikawa, I. Watanabe, S. Kosuge, M. Kabasawa, T. Suzuki, Y. Matsuda, and Y. Shinbo, Appl. Phys. Lett. 53 (1988) 1011.
M. Mayr, H. Frey, S. Weber, and I. Eisenlohr, to be presented at the 33. Annual Technical Meeting of the Society of Vacuum Coaters, New Orleans, April 29-May 4, 1990.
E. Pfender, Mat. Res. Soc. Symp. Proc. 30 (1984) 13.
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 1990 Plenum Press, New York
About this chapter
Cite this chapter
Jaeger, H., Schulze, K., Frey, H. (1990). High-Temperature Superconducting Films Prepared by Low-Pressure RF-Plasma Deposition. In: McConnell, R.D., Noufi, R. (eds) Science and Technology of Thin Film Superconductors 2. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-1345-8_41
Download citation
DOI: https://doi.org/10.1007/978-1-4684-1345-8_41
Publisher Name: Springer, Boston, MA
Print ISBN: 978-1-4684-1347-2
Online ISBN: 978-1-4684-1345-8
eBook Packages: Springer Book Archive