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Implantation in Optical Materials

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Part of the book series: NATO Advanced Study Institutes Series ((NSSB,volume 47))

Abstract

The review will emphasise the uses of ion implantation for control of optical properties of materials. In most respects the addition of ions by implantation produces similar results in both insulators and semiconductors because of new levels in the valence-conduction band gap. Consequently one is able to control such properties as luminescence, optical absorption, ESR and refractive index. Historically the techniques involving ion beams have received little attention for applications to property changes in insulators but the range of examples will indicate the possibilities are worth exploiting. The studies mentioned include searches for trace impurities in luminescence, determinations of defect structures, and production of optical waveguides and information storage systems.

On leave of absence from the School of Mathematical and Physical Sciences, University of Sussex, Brighton, BNl 9QH, England.

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© 1980 Plenum Press, New York

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Townsend, P.D. (1980). Implantation in Optical Materials. In: Perez, A., Coussement, R. (eds) Site Characterization and Aggregation of Implanted Atoms in Materials. NATO Advanced Study Institutes Series, vol 47. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-1015-0_26

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  • DOI: https://doi.org/10.1007/978-1-4684-1015-0_26

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4684-1017-4

  • Online ISBN: 978-1-4684-1015-0

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