Abstract
The review will emphasise the uses of ion implantation for control of optical properties of materials. In most respects the addition of ions by implantation produces similar results in both insulators and semiconductors because of new levels in the valence-conduction band gap. Consequently one is able to control such properties as luminescence, optical absorption, ESR and refractive index. Historically the techniques involving ion beams have received little attention for applications to property changes in insulators but the range of examples will indicate the possibilities are worth exploiting. The studies mentioned include searches for trace impurities in luminescence, determinations of defect structures, and production of optical waveguides and information storage systems.
On leave of absence from the School of Mathematical and Physical Sciences, University of Sussex, Brighton, BNl 9QH, England.
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References
Mayer J.W., Eriksson L. and Davies J.A. “Ion Implantation in Semiconductors”, Academic Press, 1970.
Dearnaley G., Freeman J.H., Nelson R.S. and Stephen J. “Ion Implantation”, North Holland, 1973.
Carter G. and Grant W.A. “Ion Implantation in Semiconductors”, Arnold, 1976.
Agajanian A.H. Rad. Effects, 23, 73, 1974.
Townsend P.D., Kelly J.C. and Hartley N.E.W. “Ion Implantation, Sputtering and their Applications” Academic Press, 1976.
Crowder B.L. (Ed) “Ion Implantation in Semiconductors and Other Materials “Yorktown Heights 1972)”, Plenum Press, 1973.
Crowder B.L. (Ed) “Ion Implantation in Semiconductors and Other Materials (Osaka 1974)”, Plenum Press, 1975.
Chernow F. (Ed) “Ion Implantation in Semiconductors and Other Materials (Boulder 1976)”, Plenum Press, 1977.
“Applications of Ion Beams to Materials” (Warwick 1975), Inst, of Physics Conf. Ser. 28, 1976.
Townsend P.D. J. Phys. E, 10, 197, 1977.
Townsend P.D. and Valette S. “Optical Effects of Ion Implantation” in “Ion Implantation in Materials Science and Technology” (Ed J.K. Hirvoven), Academic Press, 1979.
Mayhugh M.R. J. Appl. Phys., 41, 4776, 1970.
Wintersgill M.C., Townsend P.D. and Cusso-Perez F. J. de Phys. C7, 123, 1977.
Townsend P.D., Taylor G.C. and Wintersgill M.C. to be published.
Wintersgill M.C. and Townsend P.D. Phys. Stat. Sol. (a), 47, K67, 1978.
Hughes A.E. and Pells G.P. J. Phys. C., 7, 3997, 1974.
Dearnaley G., Goode P.D. and Turner J.F. 1971, cited p. 714 of ref. 2.
Hanle W. and Rau K.H. Z. Physik, 133, 297, 1952.
Van Wijngaarden A. and Hastings L. Can. J. Phys. 45, 2239, 3803, 4039, 1967.
Takagi T., Yamada I. and Kimura H. ref. 7, p. 17.
Kushiro Y. and Kobayashi T. ref. 7, p. 47 I
Hemenger P.M. and Dobbs B.C. Appl. Phys. Lett. 23, 462, 1973.
Streetman B.C., Anderson R.E. and Wolford D.J. J. Appl. Phys., 45, 974, 1974.
Demars D., Quillec M., Ravetto M., Marine J. and Guernet G. ref. 7, p. 235.
Bryant F.J. and Nahum J. J. Rad. Effects, 31, 106, 1977.
Chandler P.J. D. Phil, thesis, Sussex, 1977.
Mattern P.L., Thomas G.J. and Bauer W. J. Vac. Sci. Technol., 13, 430, 1976.
Patrick L. and Choyke W.J. Phys. Rev. B8, 1660, 1973.
Townsend P.D. and Kelly J.C. “Colour Centres and Imperfections in Insulators and Semiconductors”, Sussex Press, 1973.
Pooley D. Brit. J. Appl. Phys., 17, 855, 1966.
Saidoh M. and Itoh N. J. Phys. Chem. Solids, 34, 1167, 1973.
Hughes A.E. and Pooley D. J. Phys. C, 4, 1963, 1971.
Davenas J., Perez A. and Dupuy C. J. de Phys. C7, 37, 531, 1976.
Chassagne G., Hobbs L.W. and Serughetti J. J. de Phys. C2, 38, 229, 1977.
Kaufman J.V.R.K. 1961, Private communication.
Destefanis G.L. Doctoral thesis, Grenoble 1978.
Thevenard P. J. de Phys. C7, 37, 526, 1976.
Krefft G.B. J. Vac. Sci. Technol., 14, 533, 1977.
Arnold G.W., Krefft G.B. and Norris C.B. Appl. Phys. Lett., 25, 540, 1974.
EerNisse E.P. and Norris C.B. J. Appl. Phys., 45, 167, 3876, 5196, 1974.
Evans B.D. and Hendricks H.D. ref. 8 paper IV-2.
Peercy P.S. Proc. Int. Conf. in Insulating Crystals, Gatlinburg 1977, ORNL Conf. 771002, p. 335.
Saidoh M. and Townsend P.D. J. Phys. C, 10, 1541, 1977.
44.Chandler P.J. and Townsend P.D. To be published.
Tamir T. (Ed) “Integrated Optics”, Springer-Verlag, 1975.
Special issue of IEEE Trans. Microwave Theory and Technol. 23, n° 1, 1975.
Tien P.K. Rev. Mod. Phys. 49, 361, 1977.
Schineller E.R., Flam R.P. and Wilmot D.W. J. Opt. Soc. Amer. 58, 1171, 1968.
Webb A.P. and Townsend P.D. J. Phys. D, 9, 1343, 1976.
Kaminow I.P. and Carruthers J.R. Appl. Phys. Lett., 22, 326, 1973.
Shah M.L. Appl. Phys. Lett., 26, 652, 1975.
Ranganath T.R. and Wang S. Appl. Phys. Lett., 30, 376, 1977.
Destefanis G.L., Townsend P.D. and Gailliard J.P. Appl. Phys. Lett., 32, 293, 1978.
Garvin H.L., Garmire E., Somekh S., Stoll H. and Yariv A. Appl. Optics, 12, 445, 1973.
Valette S., Labrunie G., Deutsch J.C. and Lizet J. Appl. Optics, 16, 1289, 1977.
Evtuhov V. and Yariv A. IEEE Trans. Microwave Theory and Technol., 23, 44, 1975.
Nishimura T., Aritome H., Masuda K. and Namba S. Japanese J. Appl. Phys., 13, 1317, 1974.
Magee T.J. and Lehmann M. ref. 9, p. 112.
Schneider I., Lehmann M. and Bocker R. Appl. Phys. Lett., 25, 77, 1974.
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© 1980 Plenum Press, New York
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Townsend, P.D. (1980). Implantation in Optical Materials. In: Perez, A., Coussement, R. (eds) Site Characterization and Aggregation of Implanted Atoms in Materials. NATO Advanced Study Institutes Series, vol 47. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-1015-0_26
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DOI: https://doi.org/10.1007/978-1-4684-1015-0_26
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