Abstract
The main objective of this introductory lecture is to survey the basic processes involved in ion implantation and thus provide a framework for the subsequent lectures and discussions of this summer school. There have been several excellent theoretical surveys of energy loss by Sigmund1, Chu2, and most recently by Bonderup3. For this reason, and since we are primarily experimentalists, the present lecture notes have a strong experimental bias. The reader is therefore urged to use references 1–3 for a thorough theoretical treatment.
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References
P. Sigmund in Radiation Damage Processes in Materials (Corsica Summer School, 1973) pp 2–118.
W.K. Chu in Material Characterization Using Ion Beams (Corsica Summer School, 1976) pp 3–34.
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Davies, J.A., Howe, L.M. (1980). Basic Implantation Processes. In: Perez, A., Coussement, R. (eds) Site Characterization and Aggregation of Implanted Atoms in Materials. NATO Advanced Study Institutes Series, vol 47. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-1015-0_2
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