Abstract
Ion implantation is a nonequilibrium process. It is possible to implant materials with impurities to concentration levels which far exceed the solid solubilities. The return of the system to thermodynamic equilibrium is often accomplished by precipitation of the implanted species or a compound involving atoms of both the host and the implanted species. This process may involve very long time scales when taking place at room temperature or it may take place dynamically during the implantation. In order to understand the metallurgy of implanted systems at high concentrations, an understanding of the basic phenomena controlling second phase precipitation is necessary. These processes will be briefly reviewed and illustrated with examples of data from implanted systems.
This article is based on a lecture delivered at a N.A.T.O. Advanced Study Institute held in Aleria, Corsica between September 10th and September 23rd, 1978.
This work supported by the United States Department of Energy under Contract #AT(29-1)-789.
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© 1980 Plenum Press, New York
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Borders, J.A. (1980). Precipitation Processes in Implanted Materials. In: Perez, A., Coussement, R. (eds) Site Characterization and Aggregation of Implanted Atoms in Materials. NATO Advanced Study Institutes Series, vol 47. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-1015-0_16
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