Abstract
In thin films, with their amorphous or polycrystalline structure, a large number of dielectric polarization mechanisms are possible. These can be classified into two rather general groupings: those which occur due to the presence of interfaces and those which are characteristic of the thin film material itself. That is, this latter category does not owe its existence in any way to interfaces whereas the former exists because of interfaces. The mechanism basic to the first category is the presence of concentration modifications at electrodes and at interfaces, which may occur within the film. Although such interface effects are usually dismissed in dealing with bulk dielectric properties, they may dominate in thin film structures. Consequently their probable presence cannot be taken lightly. It should be pointed out that even in thick “bulk” samples of material it is well known that the interface effects can dominate as is the case for electrets.
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References
V. V. Daniel, “Dielectric Relaxation” Academic Press, N. Y. (1976).
H. Fröhlich, “Theory of Dielectrics”, Oxford Press, Oxford (1958).
C. Kittel, “Intro, to Solid State Physics” Wiley, Inc., N.Y. (1968).
A. Von Hippie in “Handbook of Physics” (E. Condon and H. Odis-haw, Eds.) McGraw-Hill, N.Y. (1967).
S. J. Fonash, J. A. Roger, J. Pivot, and A. Cachard, J. Appl. Phys. 45, 1223 (1974).
M. Perlman and S. Unger, J. Appl. Phys. 45, 2389 (1974).
M. Baird, Rev. of Mod. Phys. 40, 219 (1968).
J. G. Simmons and G. Nadkarni, Phys. Rev. 6, 4815 (1972).
Ai Bui, et al., Thin Solid Films 313 (1974).
C. Bucci, R. Fieschi, and G. Guidi, Phys. Rev. 148, 816 (1966).
D. M. Smyth in “Oxides and Oxide Films” (J. Diggle, Ed), Dekker, Inc., N. Y. (1973).
P. J. Harrop and D.S. Campbell in “Handbook of Thin Films” (L. Maissel & R. Glang, Eds.) McGraw-Hill, N.Y. (1970). Contains an excellent list of references up to the late 1960’s.
R. J. Friauf, J. Chem. Phys. 22, 1329 (1954).
J. G. Simmons and G. W. Taylor, Phys. Rev. 6, 4793 (1972)
J. R. Macdonald, J. Chem; Phys. 58, 4982. (1973).
H. Chang and G. Jaffe, J. Chem. Phys. 20, 1071 (1952).
J. R. Macdonald, J. Chem. Phys. 40, 3735 (1964).
F. A. Kroger, “The Cehmistry of Imperfect Crystals” Wiley, Inc. N.Y. (1964). (Contains a review of the literature on this subject up to 1963; see sec. 22.11).
E. Fatuzzo and S. Cuppo, J. Appl. Phys. 43, 1457 (1972).
J. R. Macdonald, J. Appl. Phys. 45, 73 (1974).
S. J. Fonash, J. A. Roger, and C. H. S. Dupuy, J. Appl. Phys. 45, 2907 (1974).
J. G. Simmons, G. S. Nadkarni, and M. C. Lancaster, J. Appl. Phys. 41, 538 (1970).
J. Maserjian, J. Vacuum Sci. Technol. 6, 843 (1969).
G. Jaffé, Phys. Rev. 85, 354 (1952).
M. Meaudre and R. Meaudre, Solid-St. Electron. 16, 1205 (1973).
F. Argall and A. K. Jonscher, Thin Solid Films, 2, 185 (1968).
J. C. Macfariane and C. Weaver, Phil. Pag. 31, 671 (1966).
G. Nadkarni and J. Simmons, J. Appl. Phys. 43, 3741 (1972).
J. Simmons, G. Nadkarni, and M. Lancaster, J. Appl. Phys. 41, 545 (1970).
J. A. Roger, C. H. S. Dupuy, and S. J. Fonash. J. Appl. Phys. 46 (1975); J. Solid State Chem. 12, 238, (1975).
J. G. Simmons, J. Phys. Chem. Solids 32, 1987 (1971).
J. G. Simmons, J. Phys. Chem. Solids 32, 2581 (1971).
S. J. Fonash, Solid-State Electron. 15, 783 (1972).
J. Volger in “Progress in Semiconductors” Vol 4 (A.F. Gibson Ed.) Heymood and Co., London (1960).
G. Nadkarni and J. Simmons, J. Appl. Phys. 41, 545 (1970).
S. Goldstein, J. Appl. Phys. 45, 2447 (1974).
M. C. Lancaster, Thin Solid Films 8, 213 (1971).
A. K. Jonscher, Private communication.
Cole and R. Cole, J. Chem. Phys. 9, 341 (1941).
Macdonald, J. Chem. Phys. 36, 345 (1962).
K. Jonscher, J. Non-Crystalline Solids 8–10. 293 (1972).
G. Pfister and M. Abkowitz, J. Appl. Phys. 45, 1001 (1974).
A. Willoughby and F. Yuen, Thin Solid Films 13, 199 (1972).
J. Ziman, J. Phys. C (Proc. Phys. Soc.) 1, 1532 (1968).
D. Adler, L. Flora, and S. Senturia, Solid. St. Communications 12, 9 (1973).
A. Owen and J. Robertson, J. Non-Cryst. Solids 2, 40 (1970).
M. Pollak and T. Geballe, Phys. Rev. 122, 1742 (1961).
E. Snow and P. Gibbs, J. Appl. Phys. 35, 2368 (1964).
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Fonash, S.J. (1976). Dielectric Properties of Thin Films: Polarization and Effective Polarization. In: Dupuy, C.H.S., Cachard, A. (eds) Physics of Nonmetallic Thin Films. NATO Advanced Study Institutes Series, vol 14. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-0847-8_10
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DOI: https://doi.org/10.1007/978-1-4684-0847-8_10
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