Abstract
This paper is intended as a brief description of the fundamentals of cleaning and monitoring surfaces in the semiconductor industry. First a brief review of why cleaning is important in semiconductor manufacturing is presented. Next, a brief description of the contaminants and their sources is presented. Finally, how the wafers are cleaned is discussed. Anomalies in cleaning methods, pertinent to the semiconductor industry, are highlighted along the way.
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© 1988 Plenum Press, New York
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Khilnani, A. (1988). Cleaning Semiconductor Surfaces: Facts and Foibles. In: Mittal, K.L. (eds) Particles on Surfaces 1. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-9531-1_2
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DOI: https://doi.org/10.1007/978-1-4615-9531-1_2
Publisher Name: Springer, Boston, MA
Print ISBN: 978-1-4615-9533-5
Online ISBN: 978-1-4615-9531-1
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