Abstract
Plasma chemistry of heterogeneous systems is still in its infancy. Thus, most of the preparative work is being done by the empirical approach of trial and error in tailoring the materials properties. This requires a large number of experimental points to be known of the multidimensional experimental matrix. The present paper will concentrate on the question of controlled material design which can be achieved with the present understanding of the complicated plasma- chemical phenomena under non-thermal conditions far away from thermodynamical equilibrium. A question of this kind obviously addresses the issue of non-equilibrium dissipative systems, i. e. the domain of the thermodynamics of irreversible processes. The master equation for a typical plasmachemical system contains many terms with insufficiently known elementary constants (cross sections) and it cannot be solved. All problems can be “solved” and some answers “given” to most of the questions when using “mathematical modelling”. This consists of trying to find a set of unknown elementary constants which allow one to fit the measured curve. Although one can gain some usefull information and a feeling of how to design an appropriate experiment (e.g.ref./1/), this approach has brought only a very limited improvement of our understanding of the chemistry taking place in a given system. Therefore we shall concentrate on several selected systems in order to illustrate some general rules which govern the chemical transformations in heterogeneous inorganic systems. Whenever possible the systems to be discussed as illustration will be chosen with respect to their potential applications in industry as well as in basic solid state research.
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References
F. Welling, J. Appl. Phys. 57 (1985) 4441
S. Veprek, in: Current Topics in Materials Science, Vol. 4, ed. E. Kaldis, North-Holland Publ. Co., Amsterdam (1979),p. 151
S. Veprek, Pure and Appl. Chem. 54 (1982) 1197
S. Veprek, Thin Solid Films 130 (1985) 135
P. Fauchais, E. Bourdin, J. F. Coudert and R. McPherson, in: Plasma Chemistry Vol. IV, eds. S.Veprek and M. Venugopalan, Topics in Current Chemistry 107, Springer-Verlag, Berlin 1983
R. M. Young and E. Pfender, Plasma Chem. and Plasma Processing 5 (1985) 1
D. Degout, F. Kassabji and P. Fauchais, Plasma Chem. and Plasma Processing 4 (1984) 179
Xi Chen and E. Pfender, Plasma Chem. and Plasma Processing 3 (1983) 97
S. Veprek, in: Topics in Current Chem. Vol 56, Springer-Verlag, Berlin 1975, p. 170
Y. Catherine and A. Zamouche, Plasma Chem. and Plasma Processing 5 (1985) 353
T. J. Donahue, W. R. Burger and R. Reif, Appl. Phys. Lett. 44 (1984) 346
R. Reif, J. Electrochem. Soc. 131 (1984) 2430
K. P. Ponde and A. C. Seabaugh, J. Electrochem. Soc. 131 (1984) 1359
S. J. Hudgens, A. G. Johncock and S. R. Ovshinsky, J. Non-Cryst. Solids 77&78 (1985) 809
S. Kato and T. Aoki, J. Non-Cryst. Solids 77&78 (1 985 ) 813
J. C. Anderson and S. Biswas, J. Non-Cryst. Solids 77&78 (1985) 817
S. Veprek: Poly-Micro-Crystalline and Amorphous Semiconductors, P.Pinard and S.Kalbitzer, Les editions de physique, Les Ullis, France (1984) p. 425
R. F. Bunshah, J. M. Blocher, D. M. Mattox, et al, Deposition Technologies for Films and Coatings; Development and Applications, Noyes Publications, Park Ridge, N.J., (1982)
A. von Engel, Ionized Gases, Clarendon, Oxford, 2nd ed. (1965)
M. Capitelli and E. Molinari, in: Plasma Chemistry Vol II, eds. S. Veprek and M. Venugopalan, Topics in Current Chemistry 90, Springer-Verlag, Berlin 1980
C. Gorse, F. Paniccia, J. Bretagne and M. Capitelli, J. Appl. Phys. 59 (1986) 731
R. Winkler, J. Wilhelm and A. Hess, Ann. Phys. 42 (1985) 537, (see also Beitr. Plasmaphys. 24 (1984) 285
R. Winkler, M. Capitelli, M. Dilonardo, C. Grose and J. Wilhelm, Plasma Chem. and Plasma Processing, to be publ.
S. Veprek, Pure and Appl. Chem., 48 (1976) 163
R. Winkler, M. Dilonardo, M. Capitelli and J. Wilhelm, to be published
B. Eliasson, M. Hirth and U. Kogelschatz, Proc. 7th Int. Symp. on Plasma Chem. ed. C. J. Timmermans, Eindhoven Univ. of Technol. (1985), The Netherlands, p. 339
E. Ehnke, in: Proc. Int. Conf. on Wear and Corrosoin Protection by Ion- and Plasma Assisted Coating Technol., ed. K. H. Kloos, Techical Univ. Darmstadt, ( F.R.G. ) 1983, p. 105
B. Edenhofer, Härterei Technische Mitteilungen (1974) 29, 105
E. J. Mittemeiher and P. F. Colijn, Härterei Technische Mitteilungen (1985) 40, 77
S. Veprek and M. Jurcik-Rajman, in Ref. 25, p. 90
b M. Jurcik-Rajman and S. Veprek, To be published
Y. Yoneda, S. Takami and W. Scheuermann, Härterei Technische Mitteilungen (1985) 40, 80
G. K. Huber, O. W. Holland, C. R. Clayton and C. W. White, Ion Implantation and Ion Beam Processing of Materials, North-Holland, New York (1984)
O. Auciello and R. Kelly: Ion Bombardment Modification of Surfaces, Elsevier, Amsterdam (1984)
R. Leutenecker: Verschleiss — Schutzschichten und Anwendung der CVDPVD-Verfahren, ed. H. K. Pulker, Tech. Akad. Esslingen (F.R.G.) 1985, p. 217
E. Wirz, Ph D Thesis, University of Zürich (1979)
K. Yamashita, J. K. Gimzewski and S. Veprek, J. Nucl. Materials 28&129 (1984) 705
S. Gourrier and M. Bacal, Plasma Chem. and Plasma Processing 1 (1981) 217
M. Venugopalan and S. Veprek, in: Plasma Chemistry Vol. IV Ref. 5, p. 1
S. Veprek, K. Ensslen, M. Konuma and F.-A. Sarott, in Ref. 25 p. 27
K. Ensslen and S. Veprek, Plasma Chem. and Plasma Processing (submitted)
J. K. Gimzewski and S. Veprek, Solid State Commun. 47 (1983) 747
P. C. Chittick, J. H. Alexander and H. F. Sterling, J. Electrochem. Soc. 116 (1969) 77
H. F. Sterling and R. C. G. Swann, Solid State Electron. 8 (1985) 653
W. E. Spear and P. Le Comber, Solid State Commun. 17 (1975) 1193
W. E. Spear and P. Le Comber, Phil. Mag. B 33 (1976) 935
S. Veprek and V. Marecek, Solid St. Electron. 11 (1968) 683
S. Veprek, Z. Iqbal, R. 0. Kühne, P. Capezzuto, F.-A. Sarott and J. K. Gimzewski, J. Phys.C: Solid State Phys. 16 (1983) 6241
Z. Iqbal, F.-A. Sarott and S. Veprek, ibid, 16 (1983) 2005
Z. Iqbal and S. Veprek, ibid, 14 (1982) 295
S. Veprek, Z. Iqbal and F.-A. Sarott, Phil. Mag. B (1982) 45, 137
H. Curtins and S. Veprek, Solid State Commun. 57 (1986) 1980
M. Konuma, H. Curtins, F.-A. Sarott and S. Veprek, Phil. Mag. B, submitted
S. Veprek, Z. Iqbal, H. R. Oswald, F.-A. Sarott and J. J. Wagner, J. Physique C4 (1982) 251
J. J. Wagner and S. Veprek, Plasma Chem. and Plasma Processing 2 (1982) 9
J. J. Wagner and S. Veprek, ibid 3 (1983) 219
Matsuda, S. Yamasaki, K. Nakagawa, et al, Jap. J. Appl. Phys. 19 (1980) L305
Y. Osaka and T. Imura, in: Amorphous Semiconductor Technologies & Devies, ed. Y. Hamakawa, OHMSHA Ltd, Tokyo and North-Holland, Amsterdam (1984) p. 80
F.-A. Sarott, Z. Iqbal and S. Veprek, Solid St. Commun. 42 (1982) 465
F. Mattenberger and S. Veprek, Chemtronics submitted
W. G. Townsend and M. E. Udin, Solid St. Electron 16 (1973) 207
P. Geittner, J. W4. El. Chem. Soc. Proc. 84&85 (1984) 479
P. Bachmann, Pure and Appi. Chem. 57 (1985) 1299
G. D. Khoe and H. Lydtin, to be published
H. K. Pulker, ed., Verschleiss — Schutzschichten unter Anwendung der CVDPVD-Verfahren
S. Veprek and W. Portmann, to be published
H. Suhr, A. Etspüller, E. Feurer, H. Grünwald, C. Haag and C. Oehr in Ref. 25, p. 53
R. K. Sadhir and H. E. Saunders J. Vac. Sci. Technol A3 (1985) 2093
Ch. Haag and H. Suhr, Plasma Chem. and Plasma Processing (1986) in press
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© 1987 Plenum Press, New York
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Veprek, S. (1987). Materials Design by Means of Discharge Plasmas. In: Cocke, D.L., Clearfield, A. (eds) Design of New Materials. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-9501-4_8
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DOI: https://doi.org/10.1007/978-1-4615-9501-4_8
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