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Generation of Vacuum Ultraviolet and Extreme Ultraviolet Radiation by Nonlinear Processes with Excimer Lasers

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Laser Interaction and Related Plasma Phenomena

Abstract

High spectral brightness rare gas halogen (RGH) sources can be used to generate coherent extreme ultraviolet radiation by either harmonic generation mechanisms or direct multiquantum excitation of appropriate gain media. With the use of a 4 GW 193 nm (ArF*) system operating at a pulse duration of ~ 10 ps, harmonic generation has been studied in several atomic and molecular media and used to generate ~ 20 kW at 64.3 nm and ~ 200 W at 38.6 nm. In addition, stimulated emission in molecular hydrogen, on both the Lyman and Werner bands excited by two quantum absorption at 193 nm, has resulted in the generation of radiation as short as 117.5 nm at an efficiency of conversion approaching one percent. Finally, a discussion of applications to basic measurements involving plasma diagnostics and condensed matter surface studies is given.

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© 1984 Plenum Press, New York

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Rhodes, C.K. (1984). Generation of Vacuum Ultraviolet and Extreme Ultraviolet Radiation by Nonlinear Processes with Excimer Lasers. In: Hora, H., Miley, G.H. (eds) Laser Interaction and Related Plasma Phenomena. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-7332-6_6

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  • DOI: https://doi.org/10.1007/978-1-4615-7332-6_6

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4615-7334-0

  • Online ISBN: 978-1-4615-7332-6

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