Abstract
Progress in the development of high power lasers during the past decade has opened the door to many new areas of applications. The best known, of course, is the possibility of achieving controlled thermonuclear fusion by means of laser heated plasma. However, several applications of laser plasma x-rays have more attractive current prospects. There are many points of similarity between the x-ray and fusion problem. Both, for example, require laser heating of plasmas to the kilovolt regime. But there are significant differences. The x-ray work usually involves heating of high Z materials, while the fusionable materials are low Z. Most of the x-ray applications do not require target compressions, and can use simple planar targets. Additionally, neither the plasma temperature nor the laser efficiency requirements are as severe. The main effect of these differences is that the lasers for x-ray production can be much smaller and less expensive than lasers for fusion. We have recently demonstrated that x-rays can be efficiently generated with mode locked laser pulses of several hundred mj1. The characteristics that differentiate a laser plasma x-ray source from conventional sources are:
-
(1)
The x-ray spectrum comes from highly stripped species and is predominantly L line radiation or continuum in the kilovolt regime. Heliumlike K lines are also obtainable.
-
(2)
The pulse width is very short in the ~0.1 to 10 ns range.
-
(3)
The source size is very small, ~10–200 µm diameter.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
Similar content being viewed by others
References
H. M. Epstein, R. E. Schwerzel, and B. E. Campbell, “Laser Plasma X-rays for Laboratory EXAFS.” CLEO ′82, p. 180, Technical Digest,. Phoenix, Arizona (April 1982).
P. L. Mallozzi, H. M. Epstein, R. G. Jung, D. C. Applebaum, B. P. Fairand, and W. J. Gallagher, X-ray Emission from Laser-Generated Plasmas, in: “Fundamental and Applied Laser Physics: Proceedings of the Esfahan Symposium,” M. S. Feld, A. Javan, and N. A. Warnick, eds., John Wiler & Sons, Inc. (1973).
J. W. Bond Jr., K. M. Watson, and J. A. Welch Jr., “Atomic Theory of Gas Dynamics”, Addison-Wesley, Inc., Reading, MA (1965).
R.W.P. McWhirter, Chapter 5, in.: “Plasma Diagnostic Techniques”, R. H. Huddlestone and S. L. Leonard, eds., Academic Press, New York, NY (1965).
C. Kunz, “Synchrotron Radiation, Techniques and Applications”, p. 12, Springer-Verlag, Berlin, Heidelberg, NY (1979).
P. J. Mallozzi, H. M. Epstein, and R. E. Schwerzel, Laser-Produced Plasmas as an Alternative X-ray Source for Sychrotron Radiation Research and for Microradiography, Adv. X-Ray Anal., 22: 267–279 (1979) (edited by G. J. McCarthy, et al.)
D. E. Sayers, F. W. Lytle, E. A. Stern, Adv. X-Ray Anal., 13:248 (1970);
F. W. Lytle, D. E. Sayers, E. A. Stern, Phys. Rev., B11: 4825 (1975)
E. A. Stern, D. E. Sayers, F. W. Lytle, ibid, p. 4836.
S. P. Cramer and K. O. Hodgson, Prog. Inorg. Chem., 25:1 (1979).
C. A. Ashley and S. Doniach, Phys. Rev., Bll:1279 (1975).
P. J. Mallozzi, R. E. Schwerzel, H. M. Epstein, and B. E. Campbell, Laser-EXAFS: Fast Extended X-ray Absorption Fine Structure Spectroscopy with a Single Pulse of Laser Produced X-rays, Science, 206:353–355 (October 1979).
P. J. Mallozzi, R. E. Schweezel, H. M. Epstein, and B. E. Campbell, Fast EXAFS Spectroscopy with a Laser-Produced X-ray Pulse, Phys. Rev., A23(2):824–828 (1981).
H. M. Epstein, R. E. Schwerzel, P. J. Mallozzi, and B. E. Campbell, Fast EXAFS for Analysis of Transient Species, J. Am. Chem. Soc. (to be published).
P. J. Feibelman and M. L. Knotek, Reinterpretation of Electron-Stimulated Desorption from Chemisorption Systems, Phys. Rev., B18(12):6537–6539 (December 1978).
E. Spiller and R. Feder, X-ray Lithography, Chapter 3, in: “X-ray Optics”, H. J. Queisser, ed., Springer-Verlag (1977).
H. M. Epstein, K. M. Duke, and G. W. Wharton, Laser-Generated X-ray Microradiography Applied to Entomology, Trans. Amer. Micros. Soc, 98(3):427–436 (1979).
H. I. Smith, D. L. Spears, and S. E. Bernacki, X-ray Lithography: A Complementary Technique to Electron Beam Lithography, J. Vac. Sci. Technol., 10:913 (Nov/Dec 1973).
A. Zacharias, X-ray Lithography Exposure Machines, Solid State Tech., pp 57–59 (August 1981).
J. R. Maldonado, M. E. Poulsen, T. E. Saunders, F. Vratny, and A. Zacharias, X-ray Lithography Source Using a Stationary Solid Pd Target, J. Vac. Sci. Technol., 16:1942 (Nov/Dec 1979).
D. Maydan, G. A. Coquin, H. J. Levinstein, A. K. Sinha, and D. K. Wang, Boron Nitride Mask Structure for X-ray Lithography, J. Vac. Sci. Technol., 16:1959 (Nov/Dec 1979).
G. N. Taylor and T. M. Wolf, Plasma-Developed X-ray Resists, J. Electrochem. Sci., 127:2665 (Dec 1980).
P. Duncumb, X-ray Microscopy and Microradiography, Academic Press, New York, NY (1957).
H. M. Epstein and B. E. Campbell, “Microlithography of Integrated Circuits with Laser Plasma X-ray Sources”, CLEO ′82, p. 182, Technical Digest, Phoenix, Arizona (April 1982).
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 1984 Plenum Press, New York
About this chapter
Cite this chapter
Epstein, H.M., Schwerzel, R.L., Campbell, B.E. (1984). Applications of X-Rays from Laser Produced Plasmas. In: Hora, H., Miley, G.H. (eds) Laser Interaction and Related Plasma Phenomena. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-7332-6_10
Download citation
DOI: https://doi.org/10.1007/978-1-4615-7332-6_10
Publisher Name: Springer, Boston, MA
Print ISBN: 978-1-4615-7334-0
Online ISBN: 978-1-4615-7332-6
eBook Packages: Springer Book Archive