Abstract
MBE growth and electrical characteristics of various double barrier quantum well structures on GaAs substrates are presented in the light of the optimization of structural and growth parameters. Device-oriented structures were grown not only in the conventional GaAs/GaAlAs system but also utilising a pseudomorphic InGaAs layer as central potential well or as a “prewell” adjacent to a conventional structure. We obtain the highest room temperature peak-to-valley current ratios (up to 5.9) reported to date for GaAs-based structures. Through comparative experiments with different well materials we are able to explain the asymmetry which is commonly observed between forward and reverse bias in the I-V characteristics.
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Riechert, H., Bernklau, D., Reithmaier, JP., Schnell, R.D. (1991). MBE Growth of High Performance GaAs/GaAlAs and InGaAs/GaAlAs Double Barrier Quantum Well Structures for Resonant Tunneling Devices. In: Chang, L.L., Mendez, E.E., Tejedor, C. (eds) Resonant Tunneling in Semiconductors. NATO ASI Series, vol 277. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-3846-2_3
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DOI: https://doi.org/10.1007/978-1-4615-3846-2_3
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