Abstract
The tunnel escape time or the state lifetime of electrons that determines the transversal time in GaAs/AlAs double-barrier tunneling structures has been directly determined by measuring and analysing the photoluminescence (PL) decay trate. The measured values τ were found to agree very well with the theoretical value 2ħ/ΔE determined from the full width ΔE of resonant transmission peak. This agreement is maintained even when τ falls in the time range of 10~100 ps, suggesting that the escape rate is scarcely affected by the carrier scattering. In addition, the accumulation of electron wave during the resonant tunneling process has been studied directly by measuring the PL and PL excitation spectra as functions of bias voltage. The measured density of accumulated charge is found to follow closely with the resonant current and determined to be 5×1011/cm2 at the resonant voltage.
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© 1991 Springer Science+Business Media New York
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Sakaki, H., Yoshimura, H., Tsuchiya, M., Matsusue, T. (1991). Transversal Time and Charge Accumulation in Double-Barrier Resonant Tunneling Structures. In: Chang, L.L., Mendez, E.E., Tejedor, C. (eds) Resonant Tunneling in Semiconductors. NATO ASI Series, vol 277. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-3846-2_29
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DOI: https://doi.org/10.1007/978-1-4615-3846-2_29
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