Abstract
Non thermal plasmas such as those generated by DC or RF glow discharges are attractive for plasma chemistry due to their ability to achieve high temperature chemistry at low gas temperature. In DC or RF glow discharges, the electrons carry the energy which is necessary to excite, dissociate or ionize the gas molecules and to create reactive species. The resulting plasma can be chemically reactive both in the gas phase and with the surfaces exposed to it. An important application of reactive plasma concerns the microelectronics industry and is related to VLSI (very large scale integration) processing.
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Boeuf, J.P., Belenguer, P. (1990). Fundamental Properties of RF Glow Discharges: An Approach Based on Self—Consistent Numerical Models. In: Capitelli, M., Bardsley, J.N. (eds) Nonequilibrium Processes in Partially Ionized Gases. NATO ASI Series, vol 220. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-3780-9_9
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