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Total Cross Sections for Electron Scattering and Attachment for SF6 and Its Electrical-Discharge by-Products

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Gaseous Dielectrics VI

Abstract

Sulfur hexafluoride (SF6), either pure or mixed with other gases, is commonly used as an insulator in high voltage-equipment. Consequently, many studies have been performed to investigate the decomposition of SF6 in various electrical discharges including corona,1 sparks,2 and arcs.3 These studies have shown that large quantities of toxic and corrosive by-products such as SO2, SOF2, SO2F2, SOF4, SF4, and S2F10 are produced when SF6 is dissociated in the discharge. Additionally, recent studies of SF6 as an etching gas for semiconductor processing have indicated that stable sulfur oxyfluoride by-products can account for more than 10% of the neutral molecules in the plasma.4

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References

  1. R. J. Van Brunt, Production Rates for Oxyfluorides SOF2, SO2F2, and SOF4 in SF6 Corona Discharges, J. of Res. Nal. Bar. Stand. 90 229 (1985).

    Article  Google Scholar 

  2. I. Sauers, By-product Formation in Spark Breakdown of SF6/O2 Mixtures, Plasma Chem. Plasma Process, 8 247 (1988).

    Article  Google Scholar 

  3. F. J. J. G. Janssen, Measurements at the Sub-ppm Level of Sulphur-fluorine Compounds Resulting from the Decomposition of SF6 by Arc Discharge, Kema Sci. Tech. Rep. 2 9 (1984).

    Google Scholar 

  4. G. Turban and M. Rapeaux, Dry Etching of Polyimide in O2/CF4 and O2/SF6 Plasmas, J. Electrochem. Soc. 130, 2231 (1983).

    Article  Google Scholar 

  5. A. Stamatovic and G. J. Schulz, Characteristics of the Trochoidal Electron Monochromator, Rev. Sci. Instrum. 41 423 (1970); M. R. McMillan and J. H. Moore, Optimization of the Trochoidal Electron Monochromator, ibid. 51 944 (1980); G. J. Schulz, Electron Transmission Spectroscopy: Rare Gases, Phys. Rev. A 5 1672 (1972).

    Google Scholar 

  6. H.-X. Wan, J. H. Moore, and J. A. Tossell, Electron Scattering Cross Sections and Negative Ion States of Silane and Halide Derivatives of Silane, J. Chem. Phys. 91 7340 (1989).

    Article  Google Scholar 

  7. A. R. Johnston and P. D. Burrow, Scattered-Electron Rejection in Electron Transmission Spectroscopy, J. Electron Spectrosc. Relal. Phenom. 25 119 (1982).

    Article  Google Scholar 

  8. R. E. Kennerly, R. A. Bonham, and M. McMillan, The Total Absolute Electron Scattering Cross Sections for SF6 for Incident Energies Between 0.5 and 100 eV Including Resonance Structure, J. Chem. Phys. 70 2039 (1979).

    Article  Google Scholar 

  9. M. S. Dababneh, Y. -F. Hsieh, W. E. Kaupilla, C. K. Kwan, S. J. Smith, T. S. Stein, and M. N. Uddin, Total-cross-section Measurements for Positron and Electron Scattering by O2, CH4 and SF6, Phys. Rev. A38 1207 (1988).

    Google Scholar 

  10. S. R. Hunter, J. G. Carter, and L. G. Christophorou, Low Energy Electron Attachment to SF6 in N2, Ar, and Xe Buffer Gases, J. Chem. Phys. 90 4879 (1989).

    Article  Google Scholar 

  11. M. Fenzloff, R. Gerhard, and E. Illenberger, Associative and Dissociative Electron Attachment by SF6 and SF5C1, J. Chem. Phys. 88 149 (1988).

    Article  Google Scholar 

  12. A. Chutjian and S. H. Alajajian, s-wave Threshold in Electron Attachment: Observations and Cross Sections in C14 and SF6 at Ultralow Electron Energies Phys. Rev. A 31 2885 (1985); O. J. Orient and A. Chutjian, Comparison of Calculated and Experimental Thermal Attachment Rate Constants for SF6 in the Temperature Range 200–600 K, ibid. 34 1841 (1986).

    Google Scholar 

  13. L. E. Kline, D. K. Davis, C. L. Chen, and P. J. Chantry, Dielectric Properties for SF6 and SF6 Mixtures Predicted from Basic Data, J. Appt. Phys. 50 6789 (1979).

    Article  Google Scholar 

  14. A. V. Phelps and R. J. Van Brunt, Electron-transport, Ionization, Attachment, and Dissociation Coefficients in SF6 and Its Mixtures, J. Appt. Phys. 64 4269 (1988).

    Article  Google Scholar 

  15. J. P. Novak and M. F. Fréchette, Transport Coefficients of SF6 and SF6/N2 Mixtures from Revised Data, J. Appt. Phys. 55, 107 (1984).

    Article  Google Scholar 

  16. M. Zubek, S. Kadifachi and J. B. Hasted, in Book of Abstracts of the European Conference on Atomic Physics, eds. J. Kowalski, G. zu Putlitz and H. G. Weber (Heidelberg, 1981) p. 763.

    Google Scholar 

  17. Cz. Szmytkowski, in Book of Abstracts of the 2nd European Conference on Atomic and Molecular Physics, eds. A. E. de Vries and M. J. van der Wiel (Amsterdam, 1985) p. 66.

    Google Scholar 

  18. C. Szmytkowski and K. Maciag, Absolute Total Electron-scattering Cross Section of SO2, Chem. Phys. Lett. 124 463 (1986).

    Article  Google Scholar 

  19. O.J. Orient, I. Iget, and S. K. Srivastava, Elastic Scattering of Electrons from SO2, J. Chem. Phys. 77 3523 (1982).

    Article  Google Scholar 

  20. L. Sanche and G. J. Schulz, Electron Transmission Spectroscopy: Resonances in Triatomic and Hydrocarbons, J. Chem. Phys. 58 79 (1973).

    Article  Google Scholar 

  21. J. Rademacher, L. G. Christophorou, and R. P. Blaunstein, Electron Attachment to Sulphur Dioxide in High Pressure Gases, J. Chem. Soc. Faraday Trans. II, 71 1212 (1975).

    Article  Google Scholar 

  22. I.M. Čadež, V. M. Pejčev, and M. V. Kurepa, Electron-sulphur Dioxide Total Ionization and Electron Attachment Cross Sections, J. Phys. D: Appl. Phys. 16 305 (1983).

    Article  Google Scholar 

  23. O. J. Orient and S. K. Srivastava, Production of Negative Ions by Dissociative Electron Attachment to SO2, J. Chem. Phys. 78 2949 (1983).

    Article  Google Scholar 

  24. I. Sauers, L. G. Christophorou, and S. M. Spyrou, Negative Ion Formation in SF6 Spark Byproducts, in Gaseous Dielectrics IV (L. G. Christophorou and M. O. Pace, Eds.), Pergamon Press, New York, pp. 261–272 (1984).

    Google Scholar 

  25. J. S. Wang and J. L. Franklin, Reactions and Energy Distribution in Dissociative Electron Capture Processes in Sulfuryl Halides, Int. J. Mass. Spectrom. Ion Phys. 36 233 (1980).

    Article  Google Scholar 

  26. P. G. Datskos and L. G. Christophorou, Variation with Temperature of the Electron Attachment to SO2F2, J. Chem. Phys. 90 2626 (1989).

    Article  Google Scholar 

  27. A. Benitez, J. H. Moore, and J. A. Tossell, The Correlation Between Electron Transmission and Inner Shell Electron Excitation Spectra, J. Chem. Phys. 88 6691 (1988).

    Article  Google Scholar 

  28. W. H. E. Schwarz, Interpretation of the Core Electron Excitation Spectra of Hydride Molecules and the Properties of Hydride Radicals, Chem. Phys. 11 217 (1975); H. Friedrich, B. Pittel, P. Rabe, W. H. E. Schwarz, and B. Sonntag, Overlapping Core to Valence and Core to Rydberg Transitions and Resonances in the XUV Spectra of SiF4 J. Phys. B. 13 25 (1980).

    Google Scholar 

  29. I. N. Levine, Quantum Chemistry, Allyn and Bacon, Boston (1983).

    Google Scholar 

  30. G. Piccardi, Z. Phys. 43 899 (1927); K. Krauss, W. Müller-Dunsing, and H. Nevert, Z. Naturforsch 169 1385 (1961); D. Feldman, Photoablosung von Elektronen bei Einigen Stabilen Negativen Ionen, ibid. 25a 621 (1970).

    Google Scholar 

  31. A A. krasnoperova, E. S. Gluskin, L. N. Mazalov, and V. A. Kochubel, The Fine Structure of the Lu mit Absorption Edge of Sulfur in the SO2 Molecule, J. Struct. Chem. 17 947 (1976).

    Article  Google Scholar 

  32. J. L. Dehmer, Evidence of Effective Potential Barriers in the X-ray Absorption Spectra of Molecules, Chem. Phys. 56 4496 (1988).

    Google Scholar 

  33. A. Hitchcock and M. Tronc, Ionization Current Detection of Soft X-ray Photoabsorption: Sulfur and Chlorine K-Shell Spectra of SO2F2, SO2FCl, and SO2C12 Chem. Phys. 121 265 (1988).

    Article  Google Scholar 

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Authors and Affiliations

  1. National Institute of Standards and Technology, Gaithersburg, MD, 20899, USA

    J. K. Olthoff & R. J. Van Brunt

  2. Department of Chemistry and Biochemistry, University of Maryland, College Park, MD, 20742, USA

    H.-X. Wan, J. H. Moore & J. A. Tossell

Authors
  1. J. K. Olthoff
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  2. R. J. Van Brunt
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  3. H.-X. Wan
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  4. J. H. Moore
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  5. J. A. Tossell
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Editors and Affiliations

  1. Oak Ridge National Laboratory, Oak Ridge, Tennessee, USA

    Loucas G. Christophorou  & Isidor Sauers  & 

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© 1991 Springer Science+Business Media New York

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Olthoff, J.K., Van Brunt, R.J., Wan, HX., Moore, J.H., Tossell, J.A. (1991). Total Cross Sections for Electron Scattering and Attachment for SF6 and Its Electrical-Discharge by-Products. In: Christophorou, L.G., Sauers, I. (eds) Gaseous Dielectrics VI. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-3706-9_3

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  • DOI: https://doi.org/10.1007/978-1-4615-3706-9_3

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4613-6648-5

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