Abstract
Photostimulated epitaxy is one of the promising methods for preparing films of group III–V, II–VI, and IV–VI compounds in a hydrogen atmosphere. The method consists essentially of irradiation of the charge, the substrate surface, and the gaseous volume with focused radiation from a xenon lamp with a wavelength between 0.2–1.2 μm [1].
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Maksimovskii, S.N. (1991). Photostimulated Epitaxy. In: Givargizov, E.I., Grinberg, S.A. (eds) Growth of Crystals. Growth of Crystals, vol 17. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-3660-4_3
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DOI: https://doi.org/10.1007/978-1-4615-3660-4_3
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