Abstract
The opinion that optical lithography has exhausted all of its possibilities for improving resolution and is incapable of encroaching into the submicron region—that only electron-beam, ion-beam, and x-ray lithography can be used in this region—has been expressed several times in the last ten years. Recently however, this opinion has been revised and experts now believe that optical lithography via shadow and projection systems with stepwise align and expose (steppers) can provide the resolution and reproduce elements having minimal sizes of 0.25–0.5 μm.(1–3) Thus, optical lithography can be classified with microlithography methods, and, when this is done, x-ray lithography becomes the successor to optical lithography for printing elements having sizes less than 0.2 μm.(4,5)
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Valiev, K.A. (1992). Optical Lithography. In: The Physics of Submicron Lithography. Microdevices. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-3318-4_6
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DOI: https://doi.org/10.1007/978-1-4615-3318-4_6
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