Selectivity

  • Francis F. Chen
  • Jane P. Chang

Abstract

Plasma is seldom used to etch blanket films in microelectronics fabrication. The etching of photoresist and the underlying substrate is also important since the etching selectivity is never infinite and aspect ratio dependent etching often causes some etching of the underlying substrate or thin film.

Keywords

Dioxide Chlorine Polysilicon 

Copyright information

© Springer Science+Business Media New York 2003

Authors and Affiliations

  • Francis F. Chen
    • 1
  • Jane P. Chang
    • 2
  1. 1.Electrical Engineering DepartmentUniversity of CaliforniaLos AngelesUSA
  2. 2.Chemical Engineering DepartmentUniversity of CaliforniaLos AngelesUSA

Personalised recommendations