• Francis F. Chen
  • Jane P. Chang


Plasma is seldom used to etch blanket films in microelectronics fabrication. The etching of photoresist and the underlying substrate is also important since the etching selectivity is never infinite and aspect ratio dependent etching often causes some etching of the underlying substrate or thin film.


Rate Coefficient Etching Rate Flux Ratio Underlying Substrate Surface Kinetic 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Copyright information

© Springer Science+Business Media New York 2003

Authors and Affiliations

  • Francis F. Chen
    • 1
  • Jane P. Chang
    • 2
  1. 1.Electrical Engineering DepartmentUniversity of CaliforniaLos AngelesUSA
  2. 2.Chemical Engineering DepartmentUniversity of CaliforniaLos AngelesUSA

Personalised recommendations