Abstract
Dilute bismides are a group of emerging materials with unique properties. Incorporation of a small amount of Bi in common III–V host materials results in large band-gap reduction and strong spin-orbit splitting, leading to potential applications in mid-infrared (Mid-IR) optoelectronics. In this chapter, we review recent progresses on epitaxy and characterizations of novel bismides, i.e., GaSb1 − x Bi x , InSb1 − x Bi x , InAs1 − x Bi x , and InAsSbBi. Although these dilute bismides have been successfully grown, to obtain high Bi incorporations and retain high crystal quality is still very challenging.
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Acknowledgements
The authors would like to thank Dr. Peixiong Shi from DANCHIP, Technical University of Denmark for SIMS measurements; Prof. Anders Hallen from ICT, Royal Institute of Technology for RBS measurements; Dr. Zonghe Lai and Ms. Ivy S. Roy from Chalmers University of Technology for TEM and AFM measurements; and Xiren Chen from Shanghai Institute of Technical Physics for PL measurements. The Swedish Research Council (VR) is acknowledged for financial support for this project.
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Song, Y., Gu, Y., Shao, J., Wang, S. (2013). Dilute Bismides for Mid-IR Applications. In: Li, H., Wang, Z. (eds) Bismuth-Containing Compounds. Springer Series in Materials Science, vol 186. Springer, New York, NY. https://doi.org/10.1007/978-1-4614-8121-8_1
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