Abstract
The concept of temporarily thermal relaxation is extended theoretically to assess the film residual stress. First, the contribution of the initial stress to the observable displacement field is separated with eliminating the thermal expansion effect of the material. Then, the residual stress is inversely derived through the displacement increment. Finally, finite element analysis was carried out to provide numerical description of the partial relieve of the residual stress.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
References
Tonshoff HK, Seegers H (2000) Influence of residual stress gradients on the adhesion strength of sputtered hard coatings. Thin Solid Film 377–378:340–345
Teixeira V (2002) Residual stress and cracking in thin PVD coatings. Vacuum 64:393–399
Zhang T-Y, Chen L-Q, Fu R (1999) Measurements of residual stresses in thin films deposited on silicon wafers by indentation fracture. Acta Mater 47:389–3878
Chandra T, Ionescu M, Mantovani D (1999) Residual stress analysis of textured materials by X-ray diffraction method. Mater Sci Forum 706–709:1673–1678
Chen-Wu Wu (2012) Temporarily thermal relaxation of residual stress. In: Silva Gomes JF, Mário Vaz AP (eds) Proceedings for 15th international conference on experimental mechanics, Porto/Portugal, 22–27 July 2012
Fukuhara M, Sanpei A (1993) Elastic moduli and internal frictions of Inconel 718 and Ti-6Al-4V as a function of temperature. J Mater Sci Lett 12:1122–1124
Timoshenko SP, Goodier JN (2004) Theory of elasticity, 3rd edn. McGraw-Hill Companies, Inc., New York, pp 65–71
Acknowledgements
This work was supported by the National Natural Science Foundation of China (Grant No. 11002145).
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2013 The Society for Experimental Mechanics, Inc.
About this paper
Cite this paper
Cheng, XX., Wu, CW. (2013). Film Residual Stress Assessment Method via Temporarily Thermal Relaxation. In: Ventura, C., Crone, W., Furlong, C. (eds) Experimental and Applied Mechanics, Volume 4. Conference Proceedings of the Society for Experimental Mechanics Series. Springer, New York, NY. https://doi.org/10.1007/978-1-4614-4226-4_31
Download citation
DOI: https://doi.org/10.1007/978-1-4614-4226-4_31
Published:
Publisher Name: Springer, New York, NY
Print ISBN: 978-1-4614-4225-7
Online ISBN: 978-1-4614-4226-4
eBook Packages: EngineeringEngineering (R0)