• Pooyan Sakian
  • Reza Mahmoudi
  • Arthur van Roermund
Part of the Analog Circuits and Signal Processing book series (ACSP)


Data exchange and data processing are two vital elements in our age of information which is distinguished by the possibility of free and instant access to knowledge for public. Since the experimental verification of the existence of electromagnetic waves by Heinrich Hertz in 1887, which was literally the first implementation of transmission and reception of radio electromagnetic waves, and achieving wireless transatlantic communication by Marconi in 1901, the wireless applications have observed a tremendous growth, as a widespread means of information exchange.


CMOS Technology High Data Rate Application Valid Analytical Model Physical Gate Length Performance Fine Tuning 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


  1. 1.
    Ramakrishnan H, Shedabale S, Russell G, Yakovlev A (2008) Analysing the effect of process variation to reduce parametric yield loss. IEEE international conference on integrated circuit design and technology, June 2008, pp 171–176Google Scholar
  2. 2.
    Springer SK, Lee S, Lu N, Nowak EJ, Plouchart J-O, Watts JS, Williams RQ, Zamdmer N (2006) Modeling of variation in submicrometer CMOS ULSI technologies. IEEE Trans Electron Dev 53(9):2168–2178CrossRefGoogle Scholar
  3. 3.
    Sery G, Borkar S, De V (2002) Life is CMOS: why chase the life after? Proceedings of 39th design automation conference, pp 78–83Google Scholar
  4. 4.
    Karnik T, Borkar S, De V (2002) Sub-90 nm technologies-challenges and opportunities for CAD. IEEE/ACM international conference on computer aided design, Nov 2002, pp 203–206Google Scholar
  5. 5.
    Borkar S, Karnik T, Narendra S, Tschanz J, Keshavarzi A, De V (2003) Parameter variations and impact on circuits and microarchitecture. Proceedings of design automation conference, June 2003, pp 338–342Google Scholar
  6. 6.
    International Technology Roadmap for Semiconductors
  7. 7. website, overclockers forum
  8. 8.
    Meehan MD, Purviance J (1993) Yield and reliability in microwave circuit and system design. Artech House, BostonGoogle Scholar
  9. 9.
    Strojwas AJ (2006) Conquering process variability: a key enabler for profitable manufacturing in advanced technology nodes. IEEE international symposium on semiconductor manufacturing, Sep. 2006, pp xxiii–xxxiiGoogle Scholar
  10. 10.
    Pang L-T, Qian K, Spanos CJ, Nikolic B (2009) Measurement and analysis of variability in 45 nm strained-Si CMOS technology. IEEE J Solid State Circuits 44(8):2233–2243CrossRefGoogle Scholar
  11. 11.
    Austin T, Bertacco V, Blaauw D, Mudge T (2005) Opportunities and challenges for better than worst-case design. Proceedings of the Asia and South Pacific design automation conference, Jan 2005, pp I/2–I/7Google Scholar

Copyright information

© Springer Science+Business Media New York 2012

Authors and Affiliations

  • Pooyan Sakian
    • 1
  • Reza Mahmoudi
    • 1
  • Arthur van Roermund
    • 1
  1. 1.Eindhoven University of TechnologyEindhovenThe Netherlands

Personalised recommendations