Abstract
A low power, minimum transistor count and fast access Static Random Access Memories (SRAMs) are essential for embedded multimedia and communication applications realized using System-on-Chip (SoC) technology. Hence, simultaneous or parallel read/write (R/W) access multi-port SRAM bitcells are widely employed in such embedded systems to enhance the memory bandwidth. In this chapter, multi-port SRAM bitcells are studied and their merits and de-merits are highlighted. A case study of 2-port six transistors (6T) SRAM bitcell with multi-port capabilities at reduced area overhead as compared to existing 2-port 7T and 8T SRAM bitcells, is also presented. A major challenge in designing the multi-port SRAM bitcells is maintaining the simultaneous read and write access without hampering the stability of neighbouring bitcells is a prime concern for which an array organization is also discussed which eliminates the partial write disturbance. Re-configuration of separate read-port of 7T SRAM bitcell reduces the bitline leakage current and makes the bitline sensing more robust and avoids the erroneous read operation caused due to false pull-down of the bitline. The process variation sensitivity analysis of different SRAM bitcells is also discussed to identify which SRAM transistor is in lead role to minimize the process variation effect.
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References
Aly, R., Bayoumi, M.: Low-power cache design using 7T SRAM cell. IEEE Trans. Circuit Syst. II. Express Briefs 54(4), 318–322 (2007)
Arnaud, F., Boeuf, F., Salvetti, F., Lenoble, D., Wacquant, F., Regnier, C., Morin, P., Emonet, N., Denis, E., Oberlin, J., Ceccarelli, D., Vannier, P., Imbert, G., Sicard, A., Perrot, C., Belmont, O., Guilmeau, I., Sassoulas, P., Delmedico, S., Palla, R., Leverd, F., Beverina, A., DeJonghe, V., Broekaart, M., Pain, L., Todeschini, J., Charpin, M., Laplanche, Y., Neira, D., Vachellerie, V., Borot, B., Devoivre, T., Bicais, N., Hinschberger, B., Pantel, R., Revil, N., Parthasarathy, C., Planes, N., Brut, H., Farkas, J., Uginet, J., Stolk, P., Woo, M.: A functional 0.69 mu;m2 embedded 6T-SRAM bit cell for 65 nm CMOS platform. In: Symposium on VLSI Technology, 2003. Digest of Technical Papers, pp. 65–66 (2003). doi:10.1109/VLSIT.2003.1221088
Bhavnagarwala, A.J., Tang, X., Meindl, J.D.: The impact of intrinsic device fluctuations on CMOS SRAM cell stability. IEEE J. Solid-State Circuit 36, 658–665 (2001)
Boeuf, F., Arnaud, F., Boccaccio, C., Salvetti, F., Todeschini, J., Pain, L., Jurdit, M., Manakli, S., Icard, B., Planes, N., Gierczynski, N., Denorme, S., Borot, B., Ortolland, C., Duriez, B., Tavel, B., Gouraud, P., Broekaart, M., Dejonghe, V., Brun, P., Guyader, F., Morini, P., Reddy, C., Aminpur, M., Laviron, C., Smith, S., Jacquemin, J., Mellier, M., Andre, F., Bicais-Lepinay, N., Jullian, S., Bustos, J., Skotnicki, T.: 0.248 mu;m2 and 0.334 mu;m2 conventional bulk 6T-SRAM bit-cells for 45 nm node low cost – general purpose applications. In: Symposium on VLSI Technology, 2005. Digest of Technical Papers, pp. 130–131 (2005). doi:10.1109/.2005.1469240
Calhoun, B.H., Chandrakasan, A.P.: A 256-kb 65-nm sub-threshold SRAM design for ultralow-voltage operation. IEEE J. Solid-State Circuit 42(3), 680–688 (2007)
Chang, H., Sapatnekar, S.: Full-chip analysis of leakage power under process variations, including spatial correlations. In: Proceedings of the 42nd Design Automation Conference 2005, pp. 523–528 (2005). doi:10.1109/DAC.2005.193865
Chang, L., Fried, D., Hergenrother, J., Sleight, J., Dennard, R., Montoye, R., Sekaric, L., McNab, S., Topol, A., Adams, C., Guarini, K., Haensch, W.: Stable SRAM cell design for the 32 nm node and beyond. In: Symposium on VLSI Technology, 2005. Digest of Technical Papers, Kyoto, pp. 128–129. 14–16 June 2005
Chang, L., Montoye, R., Nakamura, Y., Batson, K., Eickemeyer, R., Dennard, R., Haensch, W., Jamsek, D.: An 8T-SRAM for variability tolerance and low-voltage operation in high-performance caches. IEEE J. Solid-State Circuit 43(4), 956–963 (2008)
Gupta, V., Anis, M.: Statistical design of the 6T SRAM bit cell. IEEE Trans. Circuit Syst. I. Regul. Pap. 57(1), 93–104 (2010). doi:10.1109/TCSI.2009.2016633
Hobson, R.: A new single-ended SRAM cell with write-assist. IEEE Trans. Very Large Scale Integr. Syst. 15(2), 173–181 (2007)
Itoh, K., Sasaki, K., Nakagome, Y.: Trends in low-power ram circuit technologies. Proc. IEEE 83(4), 524–543 (1995). doi:10.1109/5.371965
Lee, D., Kwong, W., Blaauw, D., Sylvester, D.: Analysis and minimization techniques for total leakage considering gate oxide leakage. In: Proceedings of the Design Automation Conference 2003, Anaheim, pp. 175–180 (2003)
Leobandung, E., Nayakama, H., Mocuta, D., Miyamoto, K., Angyal, M., Meer, H., McStay, K., Ahsan, I., Allen, S., Azuma, A., Belyansky, M., Bentum, R.V., Cheng, J., Chidambarrao, D., Dirahoui, B., Fukasawa, M., Gerhardt, M., Gribelyuk, M., Halle, S., Harifuchi, H., Harmon, D., Heaps-Nelson, J., Hichri, H., Ida, K., Inohara, M., Inouc, I., Jenkins, K., Kawamura, T., Kim, B., Ku, S.K., Kumar, M., Lane, S., Liebmann, L., Logan, R., Melville, I., Miyashita, K., Mocuta, A., O’Neil, P., Ng, M.F., Nogami, T., Nomura, A., Norris, C., Nowak, E., Ono, M., Panda, S., Penny, C., Radens, C., Ramachandran, R., Ray, A., Rhee, S.H., Ryan, D., Shinohara, T., Sudo, G., Sugaya, F., Strane, J., Tan, Y., Tsou, L., Wang, L., Wirbeleit, F., Wu, S., Yamashita, T., Yan, H., Ye, Q., Yoneyama, D., Zamdmer, D., Zhong, H., Zhu, H., Zhu, W., Agnello, P., Bukofsky, S., Bronner, G., Crabbe, E., Freeman, G., Huang, S.F., Ivers, T., Kuroda, H., McHerron, D., Pellerin, J., Toyoshima, Y., Subbanna, S., Kepler, N., Su, L.: High performance 65 nm soi technology with dual stress liner and low capacitance SRAM cell. In: Symposium on VLSI Technology, 2005. Digest of Technical Papers, pp. 126–127 (2005). doi:10.1109/.2005.1469238
Mahmoodi, H., Mukhopadhyay, S., Roy, K.: Estimation of delay variations due to random-dopant fluctuations in nanoscale CMOS circuits. IEEE J. Solid-State Circuit 40(9), 1787–1796 (2005)
Mann, R.W., Abadeer, W.W., Breitwisch, M.J., Bula, O., Brown, J.S., Colwill, B.C., Cottrell, P.E., Crocco, W.T., Furkay, S.S., Hauser, M.J., Hook, T.B., Hoyniak, D., Johnson, J.M., Lam, C.M., Mih, R.D., Rivard, J., Moriwaki, A., Phipps, E., Putnam, C.S., Rainey, B.A., Toomey, J.J., Younus, M.I.: Ultralow-power SRAM technology. IBM J. Res. Dev. 47(5.6), 553–566 (2003). doi:10.1147/rd.475.0553
Nii, K., Masuda, Y., Yabuuchi, M., Tsukamoto, Y., Ohbayashi, S., Imaoka, S., Igarashi, M., Tomita, K., Tsuboi, N., Makino, H., Ishibashi, K., Shinohara, H.: A 65 nm ultra-high-density dual-port SRAM with 0.71 μm 8T-cell for SoC. In: Symposium on VLSI Circuits, 2006. Digest of Technical Papers, Honolulu, pp. 130–131 (2006)
Ohbayashi, S., Yabuuchi, M., Nii, K., Tsukamoto, Y., Imaoka, S., Oda, Y., Yoshihara, T., Igarashi, M., Takeuchi, M., Kawashima, H., Yamaguchi, Y., Tsukamoto, K., Inuishi, M., Makino, H., Ishibashi, K., Shinohara, H.: A 65-nm soc embedded 6T-SRAM designed for manufacturability with read and write operation stabilizing circuits. IEEE J. Solid-State Circuit 42(4), 820–829 (2007)
Ohbayashi, S., Yabuuchi, M., Kono, K., Oda, Y., Imaoka, S., Usui, K., Yonezu, T., Iwamoto, T., Nii, K., Tsukamoto, Y., Arakawa, M., Uchida, T., Okada, M., Ishii, A., Yoshihara, T., Makino, H., Ishibashi, K., Shinohara, H.: A 65 nm embedded SRAM with wafer level burn-in mode, leak-bit redundancy and cu e-trim fuse for known good die. IEEE J. Solid-State Circuit 43(1), 96–108 (2008)
PTM: Predictive technology model. In: Nanoscale Integration and Modeling (NIMO) Group. Arizona State University, Arizona. http://www.eas.asu.edu/ptm/ (2008)
Suzuki, T., Yamauchi, H., Yamagami, Y., Satomi, K., Akamatsu, H.: A stable 2-port SRAM cell design against simultaneously read/write-disturbed accesses. IEEE J. Solid-State Circuit 43(9), 2109–2119 (2008)
Takeda, K., Hagihara, Y., Aimoto, Y., Nomura, M., Nakazawa, Y., Ishii, T., Kobatake, H.: A read-static-noise-margin-free SRAM cell for low-vdd and high-speed applications. IEEE J. Solid-State Circuit 41(1), 113–121 (2006)
Takeuchi, K., Fukai, T., Tsunomura, T., Putra, A., Nishida, A., Kamohara, S., Hiramoto, T.: Understanding random threshold voltage fluctuation by comparing multiple fabs and technologies. In: IEEE International Electron Devices Meeting, 2007, IEDM 2007, pp. 467–470 (2007). http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=4418975
Verma, N., Chandrakasan, A.P.: A 256 kb 65 nm 8T subthreshold SRAM employing sense-amplifier redundancy. IEEE J. Solid-State Circuit 43(1), 141–149 (2008)
Wang, A., Chandrakasan, A.: A 180-mv subthreshold FFT processor using a minimum energy design methodology. IEEE J. Solid-State Circuit 40(1), 310–319 (2005)
Wang, C.C., Wu, C.F., Hwang, R.T., Kao, C.H.: Single-ended SRAM with high test coverage and short test time. IEEE J. Solid-State Circuit 35(1), 114–118 (2000)
Yoshimoto, M., Anami, K., Shinohara, H., Yoshihara, T., Takagi, H., Nagao, S., Kayano, S., Nakano, T.: A divided word-line structure in the static ram and its application to a 64k full CMOS ram. IEEE J. Solid-State Circuit 18(5), 479–485 (1983)
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Singh, J., Mohanty, S.P., Pradhan, D.K. (2013). 2-Port SRAM Bitcell Design. In: Robust SRAM Designs and Analysis. Springer, New York, NY. https://doi.org/10.1007/978-1-4614-0818-5_4
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