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Nonlinear Electrodynamics in Biological Systems pp 219–226Cite as

Langmuir-Blodgett Films in Microelectronics

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Abstract

The potential application of Langmuir-Blodgett-deposited films in microelectronics is discussed. The application areas which appear most promising are those requiring near perfect and uniformly thick films in the thickness range 2.5–50 nm. Three areas are discussed: the use of Langmuir-Blodgett films as electron resists in submicron device fabrication; the use of these films as insulators in metal-insulator-semiconductor (MIS) structures in which the semiconductor is a compound one; and the use of Langmuir-Blodgett films as tunneling barriers in Josephson junction electronic circuits. It is pointed out that, while preliminary evidence indicates high potential payoff for these films, the amount of data and research is very limited.

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Author information

Authors and Affiliations

  1. Computer Science and Electrical Engineering, Lehigh University, Bethlehem, PA, 18015, USA

    E. D. Thompson

Authors
  1. E. D. Thompson
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Editor information

Editors and Affiliations

  1. Jerry L. Pettis Memorial Veterans Hospital, Loma Linda, California, USA

    W. Ross Adey

  2. Hughes Aircraft Company, Carlsbad, California, USA

    Albert F. Lawrence

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© 1984 Plenum Press, New York

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Thompson, E.D. (1984). Langmuir-Blodgett Films in Microelectronics. In: Adey, W.R., Lawrence, A.F. (eds) Nonlinear Electrodynamics in Biological Systems. Springer, Boston, MA. https://doi.org/10.1007/978-1-4613-2789-9_17

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  • DOI: https://doi.org/10.1007/978-1-4613-2789-9_17

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4612-9720-8

  • Online ISBN: 978-1-4613-2789-9

  • eBook Packages: Springer Book Archive

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