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Calibration of the Photoluminescence Technique for Determination of Phosphorus in Silicon by Neutron Transmutation Doping

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Summary

A rapid accurate method for characterizing polycrystal silicon for residual electrically-active impurities has been developed based on the simultaneous determination of boron, phosphorus, arsenic and aluminum in the 10-10 atoms/atom range in silicon monocrystal by photoluminescence. The method was originally calibrated on the basis of resistivity, but this leads to a relatively large uncertainty, especially for donor impurities. This paper describes the recalibration of the method for phosphorus by NTD using a carefully controlled neutron fluence. The agreement between the three methods of measuring impurity content are presented and the statistical reproducibility of the method is discussed.

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References

  1. M. Tajima, Determination of Boron and Phosphorus Concentration in Silicon by Photoluminescence Analysis, Appl. Phys. Letters 32: 719 (1978).

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  2. M. Tajima, Characterization of Neutron-Transmutation Doping in Silicon by Photoluminescence Technique, Appl. Phys. Letters 35: 242 (1979).

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  3. M. Tajima and A. Yusa, Characterization of NTD Silicon Crystals by the Photoluminescence Technique, in: “Neutron Transmutation- Doped Silicon”. J. Guldberg, ed., Plenum Press, New York and London, (1981)

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  4. L. W. Shive, “Photoluminescence Analysis — Tool for Poly- crystal line Silicon Quality Evaluation”, Spring 1982. Meeting of the Electrochemical Society, Montreal, Quebec, Canada, May 9-14, 1982. Paper No. 190.

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  5. S. L. Gunn, J. M. Meese and D. M. Alger, High Precision Irradiation Techniques for NTD Silicon at the University of Missouri Research Reactor, in: “Neutron Transmutation Doping in Semiconductors”, J. M. Meese, ed., Plenum Press, New York and London (1979).

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© 1984 Plenum Press, New York

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Stone, B.D., Henry, A.D., Clem, P.L., Shive, L.W., Gunn, S.L. (1984). Calibration of the Photoluminescence Technique for Determination of Phosphorus in Silicon by Neutron Transmutation Doping. In: Larrabee, R.D. (eds) Neutron Transmutation Doping of Semiconductor Materials. Springer, Boston, MA. https://doi.org/10.1007/978-1-4613-2695-3_17

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  • DOI: https://doi.org/10.1007/978-1-4613-2695-3_17

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4612-9675-1

  • Online ISBN: 978-1-4613-2695-3

  • eBook Packages: Springer Book Archive

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