Dielectric Behaviour of Amorphous Thin Films

  • K. B. R. Varma
  • K. J. Rao
  • C. N. R. Rao
Part of the Institute of Amorphous Studies Series book series (IASS)


Dielectric behaviour and ultramicrostructures of r.f. sputtered films are examined in as-sputtered and crystallized conditions. LiNbO3, K3Li2Nb5O15, KTaO3 and KH2PO4, amorphous films with high dielectric constants and exhibit ferroelectric-like dielectric anomalies. This apparently universal dielectric behaviour of thin ionic films is examined using a cluster model. Anharmonicity in the vibrations of particles in the tissue region of the films is considered to be the possible origin of the dielectric behaviour.


Dielectric Constant Cluster Model High Dielectric Constant Soft Mode Dielectric Behaviour 
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Copyright information

© Plenum Press, New York 1988

Authors and Affiliations

  • K. B. R. Varma
    • 1
  • K. J. Rao
    • 1
  • C. N. R. Rao
    • 1
  1. 1.Materials Research LaboratoryIndian Institute of ScienceBangaloreIndia

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